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Titolo:
Photothermal conversion dynamics in femtosecond and picosecond discrete laser etching of Cu-phthalocyanine amorphous film analysed by ultrafast UV-VIS absorption spectroscopy
Autore:
Hosokawa, Y; Yashiro, M; Asahi, T; Masuhara, H;
Indirizzi:
Osaka Univ, Fac Engn, Dept Appl Phys, Suita, Osaka 5650871, Japan Osaka Univ Suita Osaka Japan 5650871 pl Phys, Suita, Osaka 5650871, Japan
Titolo Testata:
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY
fascicolo: 2-3, volume: 142, anno: 2001,
pagine: 197 - 207
SICI:
1010-6030(20010914)142:2-3<197:PCDIFA>2.0.ZU;2-Q
Fonte:
ISI
Lingua:
ENG
Soggetto:
DIFFUSE-REFLECTANCE SPECTROSCOPY; PHOTOINDUCED HEAT-GENERATION; NANOSECOND INTERFEROMETRY; ABLATION DYNAMICS; INDUCED DECOMPOSITION; TRANSIENT ABSORPTION; PULSE EXCITATION; POLYMER-FILMS; PHOTOLYSIS; CATALYSTS;
Keywords:
discrete etching; femtosecond laser ablation; photothermal conversion; Cu-phthalocyanine; transient absorption spectroscopy;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
53
Recensione:
Indirizzi per estratti:
Indirizzo: Masuhara, H Osaka Univ, Fac Engn, Dept Appl Phys, Yamadaoka 2-1, Suita, Osaka 5650871,Japan Osaka Univ Yamadaoka 2-1 Suita Osaka Japan 5650871 50871,Japan
Citazione:
Y. Hosokawa et al., "Photothermal conversion dynamics in femtosecond and picosecond discrete laser etching of Cu-phthalocyanine amorphous film analysed by ultrafast UV-VIS absorption spectroscopy", J PHOTOCH A, 142(2-3), 2001, pp. 197-207

Abstract

Novel etching of Cu-phthalocyanine (CuPc) amorphous film which is characteristic of ultrashort laser irradiation was successfully confirmed by tuningTi:Sapphire laser (780 nm) to 150 fs, 250 ps, or 100 ns, and the primary processes were investigated by fs pump-fs probe and ps pump-fs probe spectroscopic measurements. In the fs and ps laser ablation, we have found discrete laser etching in that the etch depth becomes constant and is independent of laser fluence above the ablation threshold, although gradual (normal) etching, in which the etch depth increase continuously with the fluence aboveablation threshold, was observed in the ns laser ablation. The transient absorption spectral measurements reveal the nonlinear photothermal conversion processes, corresponding to exciton-exciton annihilation and cyclic multiphotonic absorption. Their time evolutions during and after the excitation pulse duration were considered and elucidated to depend strongly on the excitation pulse width. On the basis of these results, we discuss an ablation mechanism for the ps and fs ablation that the temperature elevation bringing about transient high pressure is responsible for discrete etching. (C) 2001 Published by Elsevier Science B.V.

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Documento generato il 10/04/20 alle ore 15:59:38