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Titolo:
Influence of thermal decomposition behavior of titanium precursors on (Ba,Sr)TiO3 thin films
Autore:
Min, YS; Cho, YJ; Kim, D; Lee, JH; Kim, BM; Lim, SK; Lee, IM; Lee, WI;
Indirizzi:
Samsung Adv Inst Technol, Microelect Lab, Youngin City 449900, Kyungki Do,South Korea Samsung Adv Inst Technol Youngin City Kyungki Do South Korea 449900 Korea Inha Univ, Dept Chem, Nam Gu, Inchon 402751, South Korea Inha Univ Inchon South Korea 402751 , Nam Gu, Inchon 402751, South Korea
Titolo Testata:
JOURNAL DE PHYSIQUE IV
fascicolo: PR3, volume: 11, anno: 2001,
pagine: 675 - 682
SICI:
1155-4339(200108)11:PR3<675:IOTDBO>2.0.ZU;2-0
Fonte:
ISI
Lingua:
ENG
Soggetto:
CHEMICAL-VAPOR-DEPOSITION; COMPLEXES; VOLATILE;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
16
Recensione:
Indirizzi per estratti:
Indirizzo: Min, YS Samsung Adv Inst Technol, Microelect Lab, San 24, Youngin City 449900, Kyungki Do, South Korea Samsung Adv Inst Technol San 24 Youngin City Kyungki Do South Korea 449900
Citazione:
Y.S. Min et al., "Influence of thermal decomposition behavior of titanium precursors on (Ba,Sr)TiO3 thin films", J PHYS IV, 11(PR3), 2001, pp. 675-682

Abstract

An N-alkoxy-beta -ketoiminato titanium complex, Ti(2meip)(2) (2meip = 4-(2-methylethoxy)imino-2-pentanoate), was investigated as a Ti precursor for BST thin film growth, and compared with Ti(thd)(2)(O-iPr)(2) (thd = 2,2,6,6-tetramethyl-3,5-heptandionate) and Ti(mpd)(thd)(2) (mpd = 2-methyl-2,4-petanedioxy) in terms of thermal decomposition properties. It shows a moderate volatility, chemical and thermal stability, and a simple decomposition behavior above 315 degreesC. The deposited BST films with this novel precursor by liquid delivery metal-organic chemical vapor deposition (LS-MOCVD) demonstrate ultra-smooth surface without humps or hazy appearance, and relatively less variation of the titanium composition along the deposition temperature as compared with other titanium precursors, presumably due to easy and clean decomposition behavior of Ti(2meip)(2). The as-deposited BST films arebeginning to crystallize at 430 degreesC without additional annealing process.

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Documento generato il 28/09/20 alle ore 02:08:49