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Titolo:
The effects of substrate rotation on thermal plasma chemical vapor deposition of diamond
Autore:
Asmann, M; Borges, CFM; Heberlein, J; Pfender, E;
Indirizzi:
Univ Minnesota, Minneapolis, MN 55455 USA Univ Minnesota Minneapolis MN USA 55455 nesota, Minneapolis, MN 55455 USA Veeco Instruments Inc, Plainview, NY 11803 USA Veeco Instruments Inc Plainview NY USA 11803 Inc, Plainview, NY 11803 USA
Titolo Testata:
SURFACE & COATINGS TECHNOLOGY
, volume: 142, anno: 2001,
pagine: 724 - 732
SICI:
0257-8972(200107)142:<724:TEOSRO>2.0.ZU;2-B
Fonte:
ISI
Lingua:
ENG
Soggetto:
FLOW VISUALIZATION; OMVPE REACTOR; GROWTH;
Keywords:
diamond CVD; substrate rotation; DC arcjet;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
Citazioni:
23
Recensione:
Indirizzi per estratti:
Indirizzo: Pfender, E Univ Minnesota, 125 Mech Engn,111 Church St SE, Minneapolis, MN55455 USA Univ Minnesota 125 Mech Engn,111 Church St SE Minneapolis MN USA55455
Citazione:
M. Asmann et al., "The effects of substrate rotation on thermal plasma chemical vapor deposition of diamond", SURF COAT, 142, 2001, pp. 724-732

Abstract

The effects of substrate rotation on the chemical vapor deposition (CVD) of diamond is investigated utilizing a Triple Torch Plasma Reactor (TTPR) activation source. Diamond deposition experiments are conducted with an Ar-H-2-CH4 plasma gas mixture at reduced pressures. Substrate rotation is achieved by means of a variable speed DC gear motor used to rotate the substrate shaft. Rotation of the substrate during deposition, as well as rotation andoffsetting the substrate axis from the converging plasmajet axis, is foundto increase the average mass deposition rate as well as the average area of deposit when compared to a stationary substrate. Film and crystal size uniformity of the deposit are found to be enhanced, and deposit roughness decreased by rotating, and rotating plus offsetting the substrate when compared to a stationary substrate. Rotational speed and offsetting the substrate results in negligible differences compared to pure axial rotation. The effect of rotation on substrate temperature is believed to be more significant than the effect of substrate rotation on plasma fluid dynamics. (C) 2001 Elsevier Science B.V. All rights reserved.

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Documento generato il 05/04/20 alle ore 00:38:18