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Titolo:
Relationships between surface character and electrochemical processes on diamond electrodes: dual roles of surface termination and near-surface hydrogen
Autore:
Tryk, DA; Tsunozaki, K; Rao, TN; Fujishima, A;
Indirizzi:
Univ Tokyo, Sch Engn, Dept Appl Chem, Bunkyo Ku, Tokyo 1138656, Japan UnivTokyo Tokyo Japan 1138656 ppl Chem, Bunkyo Ku, Tokyo 1138656, Japan
Titolo Testata:
DIAMOND AND RELATED MATERIALS
fascicolo: 9-10, volume: 10, anno: 2001,
pagine: 1804 - 1809
SICI:
0925-9635(200109/10)10:9-10<1804:RBSCAE>2.0.ZU;2-5
Fonte:
ISI
Lingua:
ENG
Soggetto:
THIN-FILM ELECTRODES; BORON-DOPED DIAMOND; SCHOTTKY-BARRIER HEIGHT; P-TYPE DIAMOND; PHOTOELECTRON-SPECTROSCOPY; ELECTRICAL-PROPERTIES; ATOMIC-HYDROGEN; SINGLE-CRYSTAL; FIELD-EMISSION; OXYGEN;
Keywords:
semiconducting diamond; electrochemistry; surface termination;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
50
Recensione:
Indirizzi per estratti:
Indirizzo: Tryk, DA Univ Tokyo, Sch Engn, Dept Appl Chem, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan Univ Tokyo 7-3-1 Hongo Tokyo Japan 1138656 Tokyo 1138656, Japan
Citazione:
D.A. Tryk et al., "Relationships between surface character and electrochemical processes on diamond electrodes: dual roles of surface termination and near-surface hydrogen", DIAM RELAT, 10(9-10), 2001, pp. 1804-1809

Abstract

The electrochemical behavior of as-deposited, electrochemically oxidized and oxygen plasma-treated semiconducting polycrystalline diamond films was examined. The AD surface was much more active than the oxidized surfaces forsolvent discharge reactions (H-2 and O-2 evolution) as well as for electron transfer involving the ferro/ferricyanide couple. The capacitance as a function of potential was used to calculate acceptor concentration profiles, which showed an enriched layer of approximately 15 nm in depth for the as-deposited surface, possibly due to loosely bound hydrogen. These additional carriers appear to enhance electron transfer rates. (C) 2001 Elsevier Science B.V. All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 06/04/20 alle ore 04:31:37