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Titolo:
Electropolishing of 316L stainless steel for anticorrosion passivation
Autore:
Hocheng, H; Kao, PS; Chen, YF;
Indirizzi:
Natl Tsing Hua Univ, Dept Power Mech Engn, Hsinchu, Taiwan Natl Tsing Hua Univ Hsinchu Taiwan ept Power Mech Engn, Hsinchu, Taiwan Ind Technol Res Inst, Mech Ind Res Lab, Hsinchu, Taiwan Ind Technol Res Inst Hsinchu Taiwan , Mech Ind Res Lab, Hsinchu, Taiwan
Titolo Testata:
JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE
fascicolo: 4, volume: 10, anno: 2001,
pagine: 414 - 418
SICI:
1059-9495(200108)10:4<414:EO3SSF>2.0.ZU;2-9
Fonte:
ISI
Lingua:
ENG
Keywords:
electromachining; passivation; pitting corrosion; type 316L stainless steel;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
Citazioni:
10
Recensione:
Indirizzi per estratti:
Indirizzo: Hocheng, H Natl Tsing Hua Univ, Dept Power Mech Engn, Hsinchu, Taiwan NatlTsing Hua Univ Hsinchu Taiwan ech Engn, Hsinchu, Taiwan
Citazione:
H. Hocheng et al., "Electropolishing of 316L stainless steel for anticorrosion passivation", J MAT ENG P, 10(4), 2001, pp. 414-418

Abstract

316L stainless steel is deemed an indispensable material in the semiconductor industry. In many instances, the surface of the production equipment needs to be treated for low-corrosion passivation, good finish, weldability, and cleanliness. The process characteristics of electropolishing meet theserequirements well. The current study investigates the effects of the majorprocessing parameters on the anticorrosion performance and the surface roughness. The electrolyte with 10% water content and a ratio between H2SO4 and H3PO4 of 4 and 6 has been proven to be successful, showing no corrosion pitting points on the specimen surface. The electrolyte temperature of 85 +/- 10 degreesC and the electrical current density of 0.5 to 1.0 A/cm(2) are found to be optimal. The processing time beyond 3 to 5 min produces no further improvement. The addition of 10% glycerin provides a very fine surface (maximum. roughness of 0.05 mum), while the anticorrosion performance is deteriorated. The results obtained are useful for the manufacture of the semiconductor equipment.

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Documento generato il 28/03/20 alle ore 22:57:23