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Titolo:
Liquid source-MOCVD of BaxSr1-xTiO3 (BST) thin films with a N-alkoxy-beta-ketoiminato titanium complex
Autore:
Min, YS; Cho, YJ; Kim, D; Lee, JH; Kim, BM; Lim, SK; Lee, IM; Lee, WI;
Indirizzi:
Samsung Adv Inst Technol, Microelect Lab, Yongin City 449900, Kyungki Do, South Korea Samsung Adv Inst Technol Yongin City Kyungki Do South Korea 449900 Korea Inha Univ, Dept Chem, Nam Gu, Inchon 402751, South Korea Inha Univ Inchon South Korea 402751 , Nam Gu, Inchon 402751, South Korea
Titolo Testata:
CHEMICAL VAPOR DEPOSITION
fascicolo: 4, volume: 7, anno: 2001,
pagine: 146 -
SICI:
0948-1907(200107)7:4<146:LSOB(T>2.0.ZU;2-U
Fonte:
ISI
Lingua:
ENG
Soggetto:
CHEMICAL-VAPOR-DEPOSITION; PRECURSORS; VOLATILE;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
10
Recensione:
Indirizzi per estratti:
Indirizzo: Min, YS Samsung Adv Inst Technol, Microelect Lab, San 24 Nongseo Ri, Yongin City 449900, Kyungki Do, South Korea Samsung Adv Inst Technol San 24 Nongseo Ri Yongin City Kyungki Do South Korea 449900
Citazione:
Y.S. Min et al., "Liquid source-MOCVD of BaxSr1-xTiO3 (BST) thin films with a N-alkoxy-beta-ketoiminato titanium complex", CHEM VAPOR, 7(4), 2001, pp. 146

Abstract

Communication: An N-alkoxy-beta -ketoiminato titanium complex, (Ti(2meiP)(2) (2meip 4-N-(2-methylethyoxy)imino-2-pentanoate), see Figure for molecular structure, was investigated as a Ti precursor for barium strontium titanate (BST) thin film growth by liquid source metal-organic chemical vapor deposition (LS-MOCVD). The BST films obtained have an ultra-smooth surface andthe titanium composition is relatively independent of the deposition temperature.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 27/09/20 alle ore 13:07:40