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Titolo:
Electrodeposition of a thin germanium film on gold from a room temperatureionic liquid
Autore:
Endres, F;
Indirizzi:
Univ Karlsruhe, Inst Phys Chem, D-76128 Karlsruhe, Germany Univ KarlsruheKarlsruhe Germany D-76128 hem, D-76128 Karlsruhe, Germany
Titolo Testata:
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
fascicolo: 15, volume: 3, anno: 2001,
pagine: 3165 - 3174
SICI:
1463-9076(2001)3:15<3165:EOATGF>2.0.ZU;2-X
Fonte:
ISI
Lingua:
ENG
Soggetto:
IN-SITU STM; SCANNING-TUNNELING-MICROSCOPY; MOLTEN-SALT; AU(111); AU(100); AG;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
28
Recensione:
Indirizzi per estratti:
Indirizzo: Endres, F Univ Karlsruhe, Inst Phys Chem, Kaiserstr 12, D-76128 Karlsruhe,Germany Univ Karlsruhe Kaiserstr 12 Karlsruhe Germany D-76128 , Germany
Citazione:
F. Endres, "Electrodeposition of a thin germanium film on gold from a room temperatureionic liquid", PHYS CHEM P, 3(15), 2001, pp. 3165-3174

Abstract

The electrodeposition of germanium on flame annealed Au(111) films was investigated by cyclic voltammetry (CV) and in situ scanning tunneling microscopy (STM) in the room temperature ionic liquid 1-butyl-3-methylimidazolium hexafluorophosphate containing GeI4 as germanium source. The CV shows two quasireversible redox processes at 485 +/-5 mV and -30 +/-5 mV, one peak couple at -430 +/- 20 mV and two irreversible diffusion controlled reduction peaks at -910 +/- 10 mV and -1510 +/- 10 mV vs. Pt quasi reference. At potentials positive from the open circuit potential (ocp), gold oxidation startsat the steps with detectable rates up to 1 nm s(-1). At -2000 mV vs. Pt quasi reference, germanium overpotential deposition is observed. The surface shows a remarkable reordering: an almost disordered surface structure transforms to a layered structure on the time scale of about 1 h with an averaged terrace height of 330 +/- 30 pm indicative of a (111) oriented germanium bilayer. At -1500 mV the reoxidation starts both at the interior and at theedges of the deposited layers, leading to random wormlike nanostructures which heal on the time scale of about 2 h. The healing is a complex process comprising (electro)dissolution/electrodeposition and surface diffusion phenomena. A chemical attack of GeI4 on the deposits is clearly observed.

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Documento generato il 28/09/20 alle ore 13:49:18