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Titolo:
Thermogravimetric study of volatile precursors for chemical thin film deposition. Estimation of vapor pressures and source temperatures
Autore:
Niskanen, A; Hatanpaa, T; Ritala, M; Leskela, M;
Indirizzi:
Univ Helsinki, Dept Chem, Inorgan Chem Lab, FIN-00014 Helsinki, Finland Univ Helsinki Helsinki Finland FIN-00014 ab, FIN-00014 Helsinki, Finland
Titolo Testata:
JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
fascicolo: 3, volume: 64, anno: 2001,
pagine: 955 - 964
SICI:
1388-6150(2001)64:3<955:TSOVPF>2.0.ZU;2-#
Fonte:
ISI
Lingua:
ENG
Soggetto:
ATOMIC LAYER EPITAXY; ELECTRON-DIFFRACTION;
Keywords:
atomic layer deposition; chemical vapor deposition; evaporation; precursor; thermogravimetry; vapor pressure;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
10
Recensione:
Indirizzi per estratti:
Indirizzo: Leskela, M Univ Helsinki, Dept Chem, Inorgan Chem Lab, POB 55, FIN-00014 Helsinki, Finland Univ Helsinki POB 55 Helsinki Finland FIN-00014 sinki, Finland
Citazione:
A. Niskanen et al., "Thermogravimetric study of volatile precursors for chemical thin film deposition. Estimation of vapor pressures and source temperatures", J THERM ANA, 64(3), 2001, pp. 955-964

Abstract

Normal pressure thermogravimetry (TG) measurements were used to study the sublimation behavior of several volatile metal compounds, used as metal precursors in thin film fabrication by chemical vapor phase methods, like atomic layer deposition (ALD) and chemical vapor deposition (CVD). The results indicated that dynamic TG measurements may be used to find correct source temperatures to be used in an ALD reactor: a good correlation between the source temperatures used in ALD and temperatures corresponding to mass lossesof 10 and 50% in TG was verified. It was also found that isothermal TG measurements offer a simple way for the vapor pressure measurements which otherwise are not trivial for solids with only moderate volatility.

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Documento generato il 19/09/20 alle ore 17:12:37