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Titolo:
SMOOTH AND LOW OUTGROWTH-DENSITY PR1BA2CU3O7-X Y1BA2CU3O7-X PULSED-LASER DEPOSITED THIN-FILMS FOR RAMP JUNCTIONS/
Autore:
DUBREUIL D; GARRY G; GERY O; BOUZEHOUANE K;
Indirizzi:
THOMSON CSF,CENT RECH LAB,DOMAINE CORBEVILLE F-91404 ORSAY FRANCE
Titolo Testata:
Journal of alloys and compounds
fascicolo: 1-2, volume: 251, anno: 1997,
pagine: 213 - 217
SICI:
0925-8388(1997)251:1-2<213:SALOPY>2.0.ZU;2-I
Fonte:
ISI
Lingua:
ENG
Keywords:
PULSED LASER DEPOSITION; MULTILAYERS; OUTGROWTHS; ROUGHNESS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
8
Recensione:
Indirizzi per estratti:
Citazione:
D. Dubreuil et al., "SMOOTH AND LOW OUTGROWTH-DENSITY PR1BA2CU3O7-X Y1BA2CU3O7-X PULSED-LASER DEPOSITED THIN-FILMS FOR RAMP JUNCTIONS/", Journal of alloys and compounds, 251(1-2), 1997, pp. 213-217

Abstract

PBCO (150 nm) on YBCO (100 nm) thin films dedicated to Josephson junctions by ramp technology have been grown in situ on (100) SrTiO3 substrates by pulsed laser deposition (KrF, 248 nm). For YBCO monolayers, the best resistive transition and crystalline quality were for target-to-substrate distance D-TS = 60 mm, and substrate temperature T-s approximate to 775 degrees C, but such films exhibited 10(7)-10(8) outgrowths cm(-2). Outgrowth density has been improved to 0.5 - 2 x 10(6) cm(-2) by decreasing D-TS to approximate to 45 mm. After outgrowth reduction, bottom roughness has been improved by lowering the substrate temperature T-s to approximate to 730 degrees C. For PBCO, upper layers grown in these conditions often showed macroscopic defects, so T-s approximate to 750 degrees C and D-TS = 60 mm (PBCO at 60 mm showed no more outgrowths than YBCO at 45 mm) were found more appropriate. The bilayers were exclusively c-oriented with critical temperatures (R = 0) between 87 and 90 K; outgrowth densities in the range 0.5 - 3 x 10(6) cm(-2) could be obtained with bottom roughness (averaged) of 2-3 nm. Moreover, with the substrate in front of the target and despite a shutter inserted between, preablation of the target has been shown to deposit about one monolayer of non-stoichiometric material on the substrate; care should then be taken against this layer which could probably affectquality and reproducibility.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 01/10/20 alle ore 00:56:19