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Titolo:
Fabrication of ultra-clean copper surface to minimize field emission dark currents
Autore:
Suzuki, C; Nakanishi, T; Okumi, S; Gotou, T; Togawa, K; Furuta, F; Wada, K; Nishitani, T; Yamamoto, M; Watanabe, J; Kurahashi, S; Asano, K; Matsumoto, H; Yoshioka, M; Kobayakawa, H;
Indirizzi:
Nagoya Univ, Dept Phys, Chikusa Ku, Nagoya, Aichi 4648602, Japan Nagoya Univ Nagoya Aichi Japan 4648602 a Ku, Nagoya, Aichi 4648602, Japan Akita Natl Coll Technol, Dept Elect Engn, Akita 0118511, Japan Akita Natl Coll Technol Akita Japan 0118511 t Engn, Akita 0118511, Japan KEK, High Energy Accelerator Res Org, Tsukuba, Ibaraki 3050801, Japan KEKTsukuba Ibaraki Japan 3050801 es Org, Tsukuba, Ibaraki 3050801, Japan Nagoya Univ, Dept Mat Proc Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan Nagoya Univ Nagoya Aichi Japan 4648603 a Ku, Nagoya, Aichi 4648603, Japan
Titolo Testata:
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
fascicolo: 3, volume: 462, anno: 2001,
pagine: 337 - 348
SICI:
0168-9002(20010421)462:3<337:FOUCST>2.0.ZU;2-Q
Fonte:
ISI
Lingua:
ENG
Soggetto:
POLARIZED ELECTRON SOURCE; VACUUM;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
22
Recensione:
Indirizzi per estratti:
Indirizzo: Nakanishi, T Nagoya Univ, Dept Phys, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648602, Japan Nagoya Univ Furo Cho Nagoya Aichi Japan 4648602 648602, Japan
Citazione:
C. Suzuki et al., "Fabrication of ultra-clean copper surface to minimize field emission dark currents", NUCL INST A, 462(3), 2001, pp. 337-348

Abstract

The current from copper electrodes treated by four different types of surface cleaning procedures was measured under DC high field gradient condition. The best results were obtained by using the electrode rinsed with ultra-pure water after diamond turning. A field gradient of 47 MV/m was achieved with dark current at the level of 1 nA, and the microscopic field enhancement factor was estimated to be a very low value of 56. The dark current from this electrode was dependent only on the field gradient at the cathode and not affected by the total voltage applied to the gap. In this case the surface would be covered by a Cu2O layer, which creates few secondary ions by the electron bombardment. On the other hand, a large total voltage effect and a large vacuum increase were observed for the electro-polished electrode. Cu(OH)I, which would be formed at the copper surface during the electro-polishing process, would emit H2O molecules during the electron bombardment. (C) 2001 Elsevier Science B.V. All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 29/03/20 alle ore 13:17:59