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Titolo:
Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?
Autore:
Kugler, C; Bauer, F; Laimer, J; Stori, H;
Indirizzi:
Vienna Tech Univ, Inst Allgemeine Phys, A-1040 Vienna, Austria Vienna TechUniv Vienna Austria A-1040 eine Phys, A-1040 Vienna, Austria
Titolo Testata:
VACUUM
fascicolo: 2-4, volume: 61, anno: 2001,
pagine: 379 - 383
SICI:
0042-207X(20010514)61:2-4<379:ITAWTI>2.0.ZU;2-K
Fonte:
ISI
Lingua:
ENG
Soggetto:
CHEMICAL-VAPOR-DEPOSITION;
Keywords:
plasma CVD; pulsed discharge; titanium nitride; uniform deposition;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
8
Recensione:
Indirizzi per estratti:
Indirizzo: Laimer, J Vienna Tech Univ, Inst Allgemeine Phys, Wiedner Hauptstr 8-10, A-1040 Vienna, Austria Vienna Tech Univ Wiedner Hauptstr 8-10 Vienna Austria A-1040 ia
Citazione:
C. Kugler et al., "Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?", VACUUM, 61(2-4), 2001, pp. 379-383

Abstract

Recent investigations of the dynamics of pulsed direct-current discharges relevant for the production of titanium nitride coatings by plasma-assistedchemical vapour deposition in large reactors have shown that, when titanium tetrachloride is used as a feed stock gas, the spreading of the dischargeis slow, reaching some parts of the reactor with substantial delay. The result is a non-uniform plasma power density in front of the substrates as well as a spatially varying exposure time of the surface to the plasma. Theseproblems can be solved by measures, which increase the conductivity of theplasma at the beginning of the pulses. One way to achieve this goal is theuse of synchronized additional short high-voltage pulses. The present study investigates the dependence of the evolution of the discharge on parameters of the additional short high-voltage pulses. (C) 2001 Elsevier Science Ltd. All rights reserved.

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Documento generato il 01/12/20 alle ore 16:22:08