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Titolo:
Fabrication of Ti/TiO2/MOx electrodes using photoelectrodeposition technique
Autore:
Matsumoto, Y; Noguchi, M; Matsunaga, T; Kamada, K; Koinuma, M; Yamada, S;
Indirizzi:
Kumamoto Univ, Fac Engn, Dept Appl Chem, Kumamoto 8608555, Japan Kumamoto Univ Kumamoto Japan 8608555 Appl Chem, Kumamoto 8608555, Japan Teikyo Univ, Sch Sci & Engn, Dept Mat Sci & Engn, Utsunomiya, Tochigi 3208551, Japan Teikyo Univ Utsunomiya Tochigi Japan 3208551 miya, Tochigi 3208551, Japan
Titolo Testata:
ELECTROCHEMISTRY
fascicolo: 5, volume: 69, anno: 2001,
pagine: 314 - 318
SICI:
1344-3542(200105)69:5<314:FOTEUP>2.0.ZU;2-J
Fonte:
ISI
Lingua:
ENG
Soggetto:
PHOTOELECTROCHEMICAL EPITAXIAL-GROWTH; SINGLE-CRYSTAL ELECTRODES; ELECTROCHEMICAL CAPACITORS; PASSIVE BEHAVIOR; TIO2 FILMS; TITANIUM; OXIDE; DEPOSITION; MICROSCOPY;
Keywords:
titanium dioxide film; electrodeposition; lead dioxide; ruthenium oxide;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
29
Recensione:
Indirizzi per estratti:
Indirizzo: Matsumoto, Y Kumamoto Univ, Fac Engn, Dept Appl Chem, Kurokami 2-39-1, Kumamoto 8608555, Japan Kumamoto Univ Kurokami 2-39-1 Kumamoto Japan 8608555 , Japan
Citazione:
Y. Matsumoto et al., "Fabrication of Ti/TiO2/MOx electrodes using photoelectrodeposition technique", ELECTROCH, 69(5), 2001, pp. 314-318

Abstract

Photoelectrochemical deposition of metallic oxide (PbO2, RuOx, NiOOH, and CoOOH) onto a Ti substrate was studied and the electrochemical behavior of the prepared Ti/TiO2/MOx electrodes was examined. The photoelectrochemical deposition of MOx occurred in the solutions containing Mn+ ions on the Ti substrate under anodic bias. Electron holes produced on the TiO2 film surface under illumination may contribute the MOx formation. The prepared Ti/TiO2/MOx electrodes showed a tunneling current under anodic bias.

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Documento generato il 11/07/20 alle ore 17:38:32