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Titolo:
Formation of hard amorphous hydrogenated carbon films with low hydrogen concentration and their erosion in air
Autore:
Maruyama, K; Jacob, W; Roth, J;
Indirizzi:
Nagaoka Univ Technol, Dept Chem, Nagaoka, Niigata 9402188, Japan Nagaoka Univ Technol Nagaoka Niigata Japan 9402188 Niigata 9402188, Japan Max Planck Inst Plasma Phys, EURATOM Assoc, D-85748 Garching, Germany Max Planck Inst Plasma Phys Garching Germany D-85748 8 Garching, Germany
Titolo Testata:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
fascicolo: 2A, volume: 40, anno: 2001,
pagine: 788 - 793
SICI:
0021-4922(200102)40:2A<788:FOHAHC>2.0.ZU;2-N
Fonte:
ISI
Lingua:
ENG
Keywords:
hard a-C : H films; plasma CVD; erosion; thermal desorption spectra; ion beam analysis; hardness;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
--discip_EC--
Citazioni:
13
Recensione:
Indirizzi per estratti:
Indirizzo: Maruyama, K Nagaoka Univ Technol, Dept Chem, Nagaoka, Niigata 9402188, Japan Nagaoka Univ Technol Nagaoka Niigata Japan 9402188 188, Japan
Citazione:
K. Maruyama et al., "Formation of hard amorphous hydrogenated carbon films with low hydrogen concentration and their erosion in air", JPN J A P 1, 40(2A), 2001, pp. 788-793

Abstract

Hard amorphous hydrogenated carbon (a-C:H) films are prepared by radio-frequency plasma deposition from a mixture of CH4 and Ar. When these films areheated up to 1220 K under vacuum, they release Ar, a large amount of H-2 and a small amount of hydrocarbon, but the thickness of the films does not decrease. In addition, their micro-Vickers hardness decreases, but they remain hard. If these hydrogen-free semihard a-C:H films are heated at 670 K inair for 1 hi they become soft and uptake oxygen and hydrogen. On the otherhand, if the original hard a-C:H films are heated under similar conditions, they remain hard without releasing argon or uptaking oxygen. It is concluded that the reduction of hydrogen does not lead to the formation of new cross linking C-C bonds, and the pore size of tile films increases after heating allowing the penetration of oxygen and water vapor into the films.

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Documento generato il 26/10/20 alle ore 08:54:50