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Titolo:
Enhancement of photoelasticity assisted by surface acoustic wave and its application to the optical modulator
Autore:
Nakagawa, Y; Yawata, M; Kakio, S;
Indirizzi:
Yamanashi Univ, Fac Engn, Kofu, Yamanashi 4008511, Japan Yamanashi Univ Kofu Yamanashi Japan 4008511 ofu, Yamanashi 4008511, Japan
Titolo Testata:
ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS
fascicolo: 5, volume: 84, anno: 2001,
pagine: 46 - 54
SICI:
8756-663X(2001)84:5<46:EOPABS>2.0.ZU;2-X
Fonte:
ISI
Lingua:
ENG
Keywords:
surface acoustic wave; photoelasticity; Bragg diffraction; optical modulator; thin-film optical waveguide;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
--discip_EC--
Citazioni:
7
Recensione:
Indirizzi per estratti:
Indirizzo: Nakagawa, Y Yamanashi Univ, Fac Engn, Kofu, Yamanashi 4008511, Japan Yamanashi Univ Kofu Yamanashi Japan 4008511 hi 4008511, Japan
Citazione:
Y. Nakagawa et al., "Enhancement of photoelasticity assisted by surface acoustic wave and its application to the optical modulator", ELEC C JP 2, 84(5), 2001, pp. 46-54

Abstract

If a surface acoustic wave is excited on the substrate when an optical thin-film waveguide is fabricated on it, the photoelasticity of the thin film is found to nearly double. The present research investigates both theoretically and experimentally this enhancement of photoelasticity by surface acoustic waves. The structure used is (Ta2O5/SiO2/1 28 degrees YX-LiNbO3) with a thin-film waveguide made of tantalum pentoxide (Ta2O5), the most stable among the oxides. A photoacoustic deflector is fabricated in which both the TE and TM modes can propagate. From the deflection efficiency, the photoelasticity (p(11), p(12)) is estimated. It is found that p(11) is increased bya factor of 2.27 and p(12) by a factor of 2.19. As an application of this phenomenon, an optical deflector driven at low power for the TM guided modeis realized. (C) 2001 Scripta Technica.

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Documento generato il 29/03/20 alle ore 01:38:29