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Titolo:
Substrate effects during nucleation and growth of CVD diamond
Autore:
Kopf, A; Lux, B; Haubner, R;
Indirizzi:
Vienna Univ Technol, Inst Chem Technol Inorgan Mat, A-1060 Vienna, AustriaVienna Univ Technol Vienna Austria A-1060 an Mat, A-1060 Vienna, Austria
Titolo Testata:
NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
fascicolo: 1, volume: 11, anno: 2001,
pagine: 11 - 23
SICI:
1344-9931(2001)11:1<11:SEDNAG>2.0.ZU;2-U
Fonte:
ISI
Lingua:
ENG
Soggetto:
LOW-PRESSURE DIAMOND; CUTTING TOOLS; DEPOSITION; FILMS; ADHESION; PRETREATMENTS; COATINGS; SILICON; METALS; PHASE;
Keywords:
diamond; nucleation; epitaxy; substrates; pre-treatments;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
45
Recensione:
Indirizzi per estratti:
Indirizzo: Kopf, A Vienna Univ Technol, Inst Chem Technol Inorgan Mat, Getreidemarkt 9-161, A-1060 Vienna, Austria Vienna Univ Technol Getreidemarkt 9-161 Vienna Austria A-1060 ria
Citazione:
A. Kopf et al., "Substrate effects during nucleation and growth of CVD diamond", NEW DIAM FR, 11(1), 2001, pp. 11-23

Abstract

The low-pressure CVD synthesis of diamond enables the growth of pure diamond coatings from the gas phase. For this process, in all cases, a substrateis needed on which diamond can nucleate and grow. Besides the diamond deposition parameters (e.g., pressure, temperature, gas flow), which directly influence the diamond nucleation and growth, the nature of the substrates and their interactions with the reaction gases and the diamond are important factors to consider in order to achieve good deposition results. The main substrate interactions and their influences on diamond deposition are summarized. Additionally a short overview of the substrate pre-treatment process and diamond epitaxy is given.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 14/07/20 alle ore 09:38:06