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Titolo:
Slow crack growth behavior in Si3N4 sintered with Yb2Si2O7 tie-line composition additives
Autore:
Choi, HJ; Kim, HJ; Lee, JG; Kim, YW;
Indirizzi:
Univ Seoul, Dept Mat Sci & Engn, Seoul 130743, South Korea Univ Seoul Seoul South Korea 130743 ci & Engn, Seoul 130743, South Korea Korea Inst Sci & Technol, Multifunct Ceram Res Ctr, Seoul 130650, South Korea Korea Inst Sci & Technol Seoul South Korea 130650 ul 130650, South Korea
Titolo Testata:
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
fascicolo: 4, volume: 21, anno: 2001,
pagine: 471 - 475
SICI:
0955-2219(200104)21:4<471:SCGBIS>2.0.ZU;2-P
Fonte:
ISI
Lingua:
ENG
Soggetto:
SILICON-NITRIDE CERAMICS; OXIDATION BEHAVIOR; STRENGTH; SYSTEM; FILMS;
Keywords:
engine components; grain boundaries; Si3N4; sintering additives; thermal properties;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
23
Recensione:
Indirizzi per estratti:
Indirizzo: Kim, YW Univ Seoul, Dept Mat Sci & Engn, Seoul 130743, South Korea Univ Seoul Seoul South Korea 130743 n, Seoul 130743, South Korea
Citazione:
H.J. Choi et al., "Slow crack growth behavior in Si3N4 sintered with Yb2Si2O7 tie-line composition additives", J EUR CERAM, 21(4), 2001, pp. 471-475

Abstract

Slow crack growth behavior of two gas pressure sintered Si3N4 ceramics with different additives; a Yb2Si2O7 composition and an Al2O3-Y2O3 composition, was investigated by constant stress-rate ("dynamic fatigue") testing at 1400 degreesC. The slow crack growth parameter. n, was 14.7 and 6.3 for Si3N4 With Yb2Si2O7 and Al2O3-Y2O3 compositions, respectively. Superior crack growth resistance of Si3N4 with Yb2Si2O7 composition was due to its higher refractoriness of intergranular glassy films, compared to Si3N4 with Al2O3-Y2O3 composition. (C) 2001 Elsevier Science Ltd. All rights reserved.

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Documento generato il 01/10/20 alle ore 14:02:25