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Titolo:
Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures
Autore:
Aarik, J; Aidla, A; Mandar, H; Uustare, T; Kukli, K; Schuisky, M;
Indirizzi:
Univ Tartu, Inst Sci Mat, EE-51010 Tartu, Estonia Univ Tartu Tartu Estonia EE-51010 Inst Sci Mat, EE-51010 Tartu, Estonia Univ Tartu, Inst Expt Phys & Technol, EE-51010 Tartu, Estonia Univ Tartu Tartu Estonia EE-51010 hys & Technol, EE-51010 Tartu, Estonia Univ Uppsala, Angstrom Lab, Dept Inorgan Chem, S-75121 Uppsala, Sweden Univ Uppsala Uppsala Sweden S-75121 norgan Chem, S-75121 Uppsala, Sweden
Titolo Testata:
APPLIED SURFACE SCIENCE
fascicolo: 1-2, volume: 173, anno: 2001,
pagine: 15 - 21
SICI:
0169-4332(20010322)173:1-2<15:PTIHDT>2.0.ZU;2-V
Fonte:
ISI
Lingua:
ENG
Soggetto:
EPITAXY; MORPHOLOGY; HFO2;
Keywords:
hafnium dioxide; atomic layer deposition; structure; Auger electron spectroscopy;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
19
Recensione:
Indirizzi per estratti:
Indirizzo: Aarik, J Univ Tartu, Inst Sci Mat, Tahe 4, EE-51010 Tartu, Estonia Univ Tartu Tahe 4 Tartu Estonia EE-51010 EE-51010 Tartu, Estonia
Citazione:
J. Aarik et al., "Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures", APPL SURF S, 173(1-2), 2001, pp. 15-21

Abstract

High-temperature cubic phase of HfO2 was observed by reflection high-energy electron diffraction in nanocrystalline thin films grown by atomic layer deposition from HfCl4 and H2O at substrate temperatures of 880-940 degreesC. The phase was formed at properly chosen precursor doses and it was observed on the surface of films, which according to X-ray diffraction data consisted of monoclinic HfO2. The thickness of the surface layer, in which the cubic phase appeared, was estimated to be 5-10 nm. According to Auger electron spectroscopy data, formation of the cubic phase was accompanied with an increase in the ionicity of O-Hf bonds. (C) 2001 Elsevier Science B.V. All rights reserved.

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Documento generato il 04/12/20 alle ore 20:12:51