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Titolo:
Assessment of diffusional mobilities of Gr, Ni, and Si in fcc Cr-Ni-Si alloys
Autore:
Du, Y; Schuster, JC;
Indirizzi:
Univ Vienna, Inst Phys Chem, A-1090 Vienna, Austria Univ Vienna Vienna Austria A-1090 Inst Phys Chem, A-1090 Vienna, Austria
Titolo Testata:
ZEITSCHRIFT FUR METALLKUNDE
fascicolo: 1, volume: 92, anno: 2001,
pagine: 28 - 31
SICI:
0044-3093(200101)92:1<28:AODMOG>2.0.ZU;2-C
Fonte:
ISI
Lingua:
ENG
Soggetto:
SYSTEM; SIMULATION; FE;
Keywords:
diffusion of Cr, Ni, and Si in Cr-Ni-Si and; Ni-Si alloys; Cr-Ni-Si alloys; Ni-Si alloys; assessment of diffusion;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
22
Recensione:
Indirizzi per estratti:
Indirizzo: Schuster, JC Univ Vienna, Inst Phys Chem, Wahringerstr 42, A-1090 Vienna, Austria Univ Vienna Wahringerstr 42 Vienna Austria A-1090 a, Austria
Citazione:
Y. Du e J.C. Schuster, "Assessment of diffusional mobilities of Gr, Ni, and Si in fcc Cr-Ni-Si alloys", Z METALLKUN, 92(1), 2001, pp. 28-31

Abstract

The diffusional mobilities of Cr, Ni, and Si in fee Cr-Ni-Si alloys have been assessed as a function of temperature and composition by means of a CALPHAD (CALculation of PHAse Diagrams) type of procedure. Optimized kinetic parameters are presented. Comparisons between the calculated and measured diffusion coefficients show that most of the experimental information is satisfactorily accounted for by the present modeling. The obtained parameters can predict reasonably concentration profiles in binary Ni-Si and ternary Cr-Ni-Si diffusion couples.

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Documento generato il 03/12/20 alle ore 12:52:44