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Titolo:
INFLUENCE OF FIELD-ANNEALING ON THE MAGNETIC-ANISOTROPY OF AMORPHOUS FE-TB FILMS
Autore:
BECHERT A; TRAUTSCH R; ZWECK J; ANDRA W; HOFFMANN H;
Indirizzi:
UNIV REGENSBURG,INST ANGEW PHYS,UNIV STR 31 D-93053 REGENSBURG GERMANY INST PHYS HOCHTECHNOL JENA D-07743 JENA GERMANY
Titolo Testata:
Physica status solidi. a, Applied research
fascicolo: 2, volume: 161, anno: 1997,
pagine: 483 - 492
SICI:
0031-8965(1997)161:2<483:IOFOTM>2.0.ZU;2-0
Fonte:
ISI
Lingua:
ENG
Soggetto:
THIN-FILMS; ALLOYS; STRESS; ORDER; CO;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
17
Recensione:
Indirizzi per estratti:
Citazione:
A. Bechert et al., "INFLUENCE OF FIELD-ANNEALING ON THE MAGNETIC-ANISOTROPY OF AMORPHOUS FE-TB FILMS", Physica status solidi. a, Applied research, 161(2), 1997, pp. 483-492

Abstract

Using torque magnetometry (TM), SQUID and TEM we have investigated a series of thin (50 to 80 nm) amorphous Tb0.28Fe0.72 films. A differentinfluence on the magnetic anisotropy by field annealing at 323 to 873K with magnetic field either perpendicular or parallel to the sample surface is found. The pair-ordering mechanism is believed to be the source of perpendicular anisotropy in amorphous Fe-Tb films which corresponds to results from measurements of pair distribution functions (pdfs) by in-situ-TEM experiments. Unidirectional anisotropy was found in the sample plane which corresponds to the orientation of the external magnetic field during the annealing process. The magnetic (TM) and structural (TEM) results obtained suggest that the unidirectional anisotropy is due to the tilt of the easy axis from the film normal as a consequence of dual magnetron sputtering.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 29/09/20 alle ore 19:00:27