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Titolo:
Combining atomic force microscopic lithography with photolithography
Autore:
Ishibashi, M; Heike, S; Hashizume, T;
Indirizzi:
Hitachi Ltd, Adv Res Lab, Hatoyama, Saitama 3500395, Japan Hitachi Ltd Hatoyama Saitama Japan 3500395 toyama, Saitama 3500395, Japan
Titolo Testata:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
fascicolo: 12B, volume: 39, anno: 2000,
pagine: 7060 - 7062
SICI:
0021-4922(200012)39:12B<7060:CAFMLW>2.0.ZU;2-T
Fonte:
ISI
Lingua:
ENG
Soggetto:
SCANNING-PROBE LITHOGRAPHY; FABRICATION; SYSTEM;
Keywords:
AFM; SPM; nanolithography; photolithography;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
--discip_EC--
Citazioni:
6
Recensione:
Indirizzi per estratti:
Indirizzo: Ishibashi, M Hitachi Ltd, Adv Res Lab, Hatoyama, Saitama 3500395, Japan Hitachi Ltd Hatoyama Saitama Japan 3500395 ma 3500395, Japan
Citazione:
M. Ishibashi et al., "Combining atomic force microscopic lithography with photolithography", JPN J A P 1, 39(12B), 2000, pp. 7060-7062

Abstract

We developed a method that combines atomic force microscopic (AFM) lithography with photolithography. This method uses small-step structures on the resist surface, fabricated by slight development, to align the patterns produced by photolithography and AFM lithography. We used this hybrid method tofabricate nan ow wire patterns that led to large contact-pad patterns and demonstrated it's effectiveness at reducing drawing time and lengths.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 28/03/20 alle ore 23:25:25