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Titolo:
Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism
Autore:
Aarik, J; Aidla, A; Mandar, H; Uustare, T;
Indirizzi:
Univ Tartu, Inst Sci Mat, EE-51010 Tartu, Estonia Univ Tartu Tartu Estonia EE-51010 Inst Sci Mat, EE-51010 Tartu, Estonia
Titolo Testata:
APPLIED SURFACE SCIENCE
fascicolo: 1-2, volume: 172, anno: 2001,
pagine: 148 - 158
SICI:
0169-4332(20010301)172:1-2<148:ALDOTD>2.0.ZU;2-V
Fonte:
ISI
Lingua:
ENG
Soggetto:
TIO2 THIN-FILMS; EPITAXY; TEMPERATURE; THICKNESS; SILICA;
Keywords:
atomic layer deposition; titanium dioxide; crystallization; adsorption;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
22
Recensione:
Indirizzi per estratti:
Indirizzo: Aarik, J Univ Tartu, Inst Sci Mat, Tahe 4, EE-51010 Tartu, Estonia Univ Tartu Tahe 4 Tartu Estonia EE-51010 EE-51010 Tartu, Estonia
Citazione:
J. Aarik et al., "Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism", APPL SURF S, 172(1-2), 2001, pp. 148-158

Abstract

Atomic layer deposition (ALD) of titanium dioxide from TiCl4 and H2O was studied at substrate temperatures of 100-400 degreesC. Using a real-time quartz crystal microbalance method, it was demonstrated that although the surface reactions were self-limited, the growth rate depended on the temperature and development of the thin film structure. Relatively low growth rate which was obtained in the TiCl4/H2O ALD process, was found to be a result of a significant chlorine amount adsorbed during the TiCl4 pulse. Surface intermediates formed in the initial stage of TiCl4 adsorption were unstable andweakly bonded to the surface. Desorption and decomposition of these species additionally influenced the deposition late and, especially, its dependence on the precursor pulse times. (C) 2001 Elsevier Science B.V. All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 28/11/20 alle ore 12:36:02