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Titolo:
Low-frequency pulsed reactive magnetron discharges
Autore:
Billard, A; Perry, F;
Indirizzi:
Ecole Mines, Lab Sci & Genie Surfaces, UMR 7570, F-54042 Nancy, France Ecole Mines Nancy France F-54042 rfaces, UMR 7570, F-54042 Nancy, France
Titolo Testata:
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
fascicolo: 297, volume: 55, anno: 2000,
pagine: 224 -
SICI:
1266-0167(2000)55:297<224:LPRMD>2.0.ZU;2-N
Fonte:
ISI
Lingua:
FRE
Soggetto:
DEPOSITION; AR-N2; TIO2;
Keywords:
reactive sputtering; high rate deposition; ceramic filmss; unstable behaviour;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
Citazioni:
20
Recensione:
Indirizzi per estratti:
Indirizzo: Billard, A Ecole Mines, Lab Sci & Genie Surfaces, UMR 7570, Parc Saurupt, F-54042 Nancy, France Ecole Mines Parc Saurupt Nancy France F-54042 42 Nancy, France
Citazione:
A. Billard e F. Perry, "Low-frequency pulsed reactive magnetron discharges", VIDE, 55(297), 2000, pp. 224

Abstract

Reactive magnetron sputtering isa powerful technique for deposition of ceramic coatings which however often presents an unstable behaviour at the origin of a very low deposition rate for stoichiometric coatings. Various methods are available in the literature to avoid the drawback of this unstable sputtering behaviour. In this paper, we present a new method based on the low frequency modulation of the discharge current. Th,,im to be reached is the establishment of a metastable periodic steady state cycle with,average set point as close as possible as the critical set point located into the unstable domain of the sputtered flux - discharge current characteristic, andyielding the high rate deposition of the stoichiometric film.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 28/09/20 alle ore 05:39:51