Catalogo Articoli (Spogli Riviste)

OPAC HELP

Titolo:
THIN-FILM CHARACTERIZATION OF DIAMOND-LIKE CARBON-FILMS PREPARED BY RF PLASMA CHEMICAL-VAPOR-DEPOSITION
Autore:
HIRAKURI KK; MINORIKAWA T; FRIEDBACHER G; GRASSERBAUER M;
Indirizzi:
TECH UNIV VIENNA,INST ANALYT CHEM,GETREIDEMARKT 9-151 A-1060 VIENNA AUSTRIA TOKYO DENKI UNIV,FAC SCI & ENGN,DEPT APPL ELECT ENGN HATOYAMA SAITAMA35003 JAPAN
Titolo Testata:
Thin solid films
fascicolo: 1-2, volume: 302, anno: 1997,
pagine: 5 - 11
SICI:
0040-6090(1997)302:1-2<5:TCODCP>2.0.ZU;2-S
Fonte:
ISI
Lingua:
ENG
Soggetto:
ATOMIC-FORCE MICROSCOPY; PHYSICAL-PROPERTIES; GLOW-DISCHARGE;
Keywords:
DIAMOND-LIKE CARBON FILM; ATOMIC FORCE MICROSCOPY; SURFACE MORPHOLOGY; INFRARED SPECTROSCOPY;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
23
Recensione:
Indirizzi per estratti:
Citazione:
K.K. Hirakuri et al., "THIN-FILM CHARACTERIZATION OF DIAMOND-LIKE CARBON-FILMS PREPARED BY RF PLASMA CHEMICAL-VAPOR-DEPOSITION", Thin solid films, 302(1-2), 1997, pp. 5-11

Abstract

Using atomic force microscopy and infrared spectroscopy, diamond-likecarbon films deposited by r.f. plasma discharge were investigated. Hardness and roughness of the films strongly depend on the bias voltage of the substrates and thus the pressure in the deposition chamber. At higher pressures, the surface roughness of the films increases with their thickness. For films deposited at medium pressures, the roughness is almost constant regardless of the film thickness. At pressures below 53 Pa decreasing roughness is observed and hard films are obtained. These findings can be explained by the predominance of different species in the plasma. At low pressure, ionic species an accelerated towards sharp tips on the film surface leading to sputter removal of weakly bond material in these regions. At higher pressure neutral species in the plasma dominate. Thus, the balancing effect of sputtering is not observed. Hydrogen content and sp(3)/sp(2) ratios obtained from IR spectra revealed that the lower hardness of the rough surfaces can be explained by a higher content of sp(2) species in the films deposited at high pressure. Whereas the intensity ratio of sp(3)/sp(2) is almost constant for the films at higher pressure preferred sputter removal of sp(2) species leads to a significant increase of that ratio at low pressure. (C) 1997 Elsevier Science S.A.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 29/09/20 alle ore 07:39:25