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Titolo:
Evaluation of a 100 kV thermal field emission electron-beam nanolithography system
Autore:
Tennant, DM; Fullowan, R; Takemura, H; Isobe, M; Nakagawa, Y;
Indirizzi:
Bell Labs, Lucent Technol, Holmdel, NJ 07733 USA Bell Labs Holmdel NJ USA07733 abs, Lucent Technol, Holmdel, NJ 07733 USA Bell Labs, Lucent Technol, Murray Hill, NJ 07728 USA Bell Labs Murray Hill NJ USA 07728 ent Technol, Murray Hill, NJ 07728 USA JEOL Ltd, Akishima, Tokyo 1968558, Japan JEOL Ltd Akishima Tokyo Japan 1968558 Ltd, Akishima, Tokyo 1968558, Japan
Titolo Testata:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
fascicolo: 6, volume: 18, anno: 2000,
pagine: 3089 - 3094
SICI:
1071-1023(200011/12)18:6<3089:EOA1KT>2.0.ZU;2-Z
Fonte:
ISI
Lingua:
ENG
Soggetto:
HIGH-RESOLUTION; LITHOGRAPHY;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
10
Recensione:
Indirizzi per estratti:
Indirizzo: Tennant, DM Bell Labs, Lucent Technol, 101 Crawford Corner Rd, Holmdel, NJ07733 USA Bell Labs 101 Crawford Corner Rd Holmdel NJ USA 07733 7733 USA
Citazione:
D.M. Tennant et al., "Evaluation of a 100 kV thermal field emission electron-beam nanolithography system", J VAC SCI B, 18(6), 2000, pp. 3089-3094

Abstract

We report on the results of performance evaluation tests of a JEOL model JBX-9300FS electron-beam nanolithography system operating at 100 kV. The system was tested in the areas of lithographic resolution, stability, exposureuniformity, and pattern placement accuracy. A minimum spot size of 4 nm was measured at a current of 100 pA. The spot remained below 6.5 nm for beam currents up to 8 nA. Maximum digital to analog converter linearity and deflection amplifier errors were below 0.5 nm. Pattern placement accuracy in a 50 mm square area was found to be within +/-16 nm and inside the 500 mum writing field within +/-7 nm. (C) 2000 American Vacuum Society. [S0734-211X(00)05506-2].

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Documento generato il 10/04/20 alle ore 13:26:16