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Titolo:
How to make polyvinylphenol inhibitable by diazonaphthoquinone sulfonates
Autore:
Yan, ZL; Yeh, TF; He, XH; Reiser, A; Schadt, FL; Fincher, CR;
Indirizzi:
Polytech Univ, Inst Imaging Sci, Brooklyn, NY 11201 USA Polytech Univ Brooklyn NY USA 11201 t Imaging Sci, Brooklyn, NY 11201 USA Dupont Co, Wilmington, DE 19880 USA Dupont Co Wilmington DE USA 19880Dupont Co, Wilmington, DE 19880 USA
Titolo Testata:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
fascicolo: 6, volume: 18, anno: 2000,
pagine: 2745 - 2749
SICI:
1071-1023(200011/12)18:6<2745:HTMPIB>2.0.ZU;2-1
Fonte:
ISI
Lingua:
ENG
Soggetto:
PHENOLIC POLYMER DISSOLUTION; DIAZOQUINONE RESISTS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
10
Recensione:
Indirizzi per estratti:
Indirizzo: Yan, ZL Polytech Univ, Inst Imaging Sci, 6 Metrotech Ctr, Brooklyn, NY 11201 USA Polytech Univ 6 Metrotech Ctr Brooklyn NY USA 11201 , NY 11201 USA
Citazione:
Z.L. Yan et al., "How to make polyvinylphenol inhibitable by diazonaphthoquinone sulfonates", J VAC SCI B, 18(6), 2000, pp. 2745-2749

Abstract

There is interest in phenolic resins that are transparent at 248 nm and the dissolution of which in alkaline aqueous developers can be inhibited by diazonaphthoquinone sulfonic acid derivatives. the standard photoactive compounds (PACs) of novolak resists. Poly(4-hydroxystyrene), i.e., poly(vinylphenol), has the requisite optical properties, but its dissolution is not very effectively inhibited by standard PACs. We have now found that poly(4-hydroxystyrene) can be made more inhibitable by increasing the acidity of its OH groups and, at the same time, lowering the concentration of the acidic OH groups in the resin. (C) 2000 American Vacuum Society. [S0734-211X(00)13406-7].

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 09/07/20 alle ore 19:58:01