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Titolo:
Real-time assessment of selected surface preparation regimens for 4H-SiC surfaces using spectroscopic ellipsometry
Autore:
Edwards, NV; Jarrendahl, K; Aspnes, DE; Robbie, K; Powell, GD; Cobet, C; Esser, N; Richter, W; Madsen, LD;
Indirizzi:
Linkoping Univ, Inst Fys & Matteknik, SE-58183 Linkoping, Sweden LinkopingUniv Linkoping Sweden SE-58183 nik, SE-58183 Linkoping, Sweden N Carolina State Univ, Raleigh, NC 27695 USA N Carolina State Univ Raleigh NC USA 27695 te Univ, Raleigh, NC 27695 USA Tech Univ Berlin, Inst Festkorperphys, Berlin, Germany Tech Univ Berlin Berlin Germany n, Inst Festkorperphys, Berlin, Germany
Titolo Testata:
SURFACE SCIENCE
fascicolo: 1, volume: 464, anno: 2000,
pagine: L703 - L707
SICI:
0039-6028(20000920)464:1<L703:RAOSSP>2.0.ZU;2-1
Fonte:
ISI
Lingua:
ENG
Soggetto:
INSB;
Keywords:
contact; ellipsometry; etching; semiconducting surfaces; silicon carbide; vicinal single crystal surfaces;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
16
Recensione:
Indirizzi per estratti:
Indirizzo: Edwards, NV Linkoping Univ, Inst Fys & Matteknik, SE-58183 Linkoping, Sweden Linkoping Univ Linkoping Sweden SE-58183 3 Linkoping, Sweden
Citazione:
N.V. Edwards et al., "Real-time assessment of selected surface preparation regimens for 4H-SiC surfaces using spectroscopic ellipsometry", SURF SCI, 464(1), 2000, pp. L703-L707

Abstract

Spectroscopic ellipsometry (SE) was used to assess the removal of overlayer material from 4H-SiC (0001) and (0001) [Si- and C-face] surfaces in real time and, in particular, the critical final step of an otherwise standard RCA cleaning regimen commonly used to prepare SiC surfaces for contact formation. The treatments selected [buffered hydrofluoric acid (HF), concentrated HF, and dilute HF] removed 4-40 Angstrom of effective SiO2 overlayer thickness from these surfaces. The concentrated HF treatment yielded the best surface, i.e. that with the most abrupt transition region between bulk and surface and with the most oxide material removed. A fourth treatment regimen(sequential application of methanol, water, and 5% HF in methanol) was also developed for comparison with the full RCA clean. (C) 2000 Elsevier Science B.V. All rights reserved.

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Documento generato il 21/01/21 alle ore 04:12:28