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Titolo:
Comparison of titanium oxide films grown on bare glass and boiled glass in50% H2SO4 by metal-organic chemical vapor deposition
Autore:
Jang, HK; Whangbo, SW; Chung, YD; Kim, TG; Kim, HB; Lyo, IW; Whang, CN; Wang, CH; Choi, DJ; Kim, TK; Lee, HS;
Indirizzi:
Yonsei Univ, Atom Scale Surface Sci Res Ctr, Seoul 120749, South Korea Yonsei Univ Seoul South Korea 120749 Res Ctr, Seoul 120749, South Korea Yonsei Univ, Dept Phys, Seoul 120749, South Korea Yonsei Univ Seoul South Korea 120749 ept Phys, Seoul 120749, South Korea Yonsei Univ, Dept Ceram, Seoul 120749, South Korea Yonsei Univ Seoul South Korea 120749 pt Ceram, Seoul 120749, South Korea Chonju Natl Univ Educ, Dept Sci Educ, Chongju 560757, South Korea Chonju Natl Univ Educ Chongju South Korea 560757 gju 560757, South Korea Pohang Univ Sci & Technol, Beamline Div, Pohang Accelerator Lab, Pohang 790784, South Korea Pohang Univ Sci & Technol Pohang South Korea 790784 790784, South Korea
Titolo Testata:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
fascicolo: 5, volume: 18, anno: 2000,
pagine: 2394 - 2399
SICI:
0734-2101(200009/10)18:5<2394:COTOFG>2.0.ZU;2-U
Fonte:
ISI
Lingua:
ENG
Soggetto:
TIO2;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
17
Recensione:
Indirizzi per estratti:
Indirizzo: Jang, HK Yonsei Univ, Atom Scale Surface Sci Res Ctr, Seoul 120749, South Korea Yonsei Univ Seoul South Korea 120749 Seoul 120749, South Korea
Citazione:
H.K. Jang et al., "Comparison of titanium oxide films grown on bare glass and boiled glass in50% H2SO4 by metal-organic chemical vapor deposition", J VAC SCI A, 18(5), 2000, pp. 2394-2399

Abstract

Titanium oxide films were deposited on bare glass and boiled glass in 50% H2SO4 for 30 min at various substrate temperatures by metal-organic chemical vapor deposition. We investigated the effects of a substrate temperature between 300 and 550 degrees C on such properties as thermal stability, deposition rate, and chemical states of the films. The thickness of the films is independent of the substrate treatments. The deposition rate of the filmsis linearly decreased with increasing substrate temperature. Rutherford backscattering spectroscopy and x-ray photoelectron spectroscopy results indicate that the H2SO4 treated glass substrate is superior to the bare glass substrate in the suppression of out-diffusion of sodium and calcium through the TiO2 film till a substrate temperature of 500 degrees C. There exist only Ti3+ and Ti4+ oxidation states in the film regardless of a substrate temperature and substrate treatment. Ti3+ fractional composition are changed slightly between 0.11 and 0.17 and Ti4+ fractional composition are changed between 0.82 and 0.90 with varying substrate temperature. (C) 2000 American Vacuum Society. [S0734-2101(00)06505-2].

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Documento generato il 04/04/20 alle ore 12:25:02