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Titolo:
C-Ni amorphous multilayers studied by atomic force microscopy
Autore:
Ulmeanu, M; Serghei, A; Mihailescu, IN; Budau, P; Enachescu, M;
Indirizzi:
Natl Inst Laser Plasma & Radiat Phys, Dept Lasers, Bucharest, Magurele, Romania Natl Inst Laser Plasma & Radiat Phys Bucharest Magurele Romania Romania Natl Inst Mat Phys, Bucharest, Magurele, Romania Natl Inst Mat Phys Bucharest Magurele Romania charest, Magurele, Romania Univ Bucharest, Fac Phys, Bucharest, Romania Univ Bucharest Bucharest Romania ucharest, Fac Phys, Bucharest, Romania Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA Univ Calif Berkeley Berkeley CA USA 94720 atl Lab, Berkeley, CA 94720 USA
Titolo Testata:
APPLIED SURFACE SCIENCE
fascicolo: 2-3, volume: 165, anno: 2000,
pagine: 109 - 115
SICI:
0169-4332(20000922)165:2-3<109:CAMSBA>2.0.ZU;2-S
Fonte:
ISI
Lingua:
ENG
Keywords:
multilayer; RF magnetron sputtering deposition; atomic force microscopy; surface roughness; root-mean-square roughness; power spectral density; fractal dimension;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
11
Recensione:
Indirizzi per estratti:
Indirizzo: Ulmeanu, M Natl Inst Laser Plasma & Radiat Phys, Dept Lasers, POB MG-36, Bucharest, Magurele, Romania Natl Inst Laser Plasma & Radiat Phys POB MG-36 Bucharest Magurele Romania
Citazione:
M. Ulmeanu et al., "C-Ni amorphous multilayers studied by atomic force microscopy", APPL SURF S, 165(2-3), 2000, pp. 109-115

Abstract

Amorphous C-Ni superlattice films designed as normal-incidence reflector for 5 nm have been grown on quartz substrate by magnetron sputter deposition. A new digital signal processor-based atomic force microscope (AFM) systemhas been involved in investigating the surface topography of the final surface of the multilayer structure as well as the substrate. In the first step, roughness measurements involving AFM-tips with different radius curvature indicate the C-Ni multilayer surface profile as being in the nanometer and sub-nanometer range, representing a high quality ended surface of the reflectors. In the second step, a study of the roughness distribution using power spectral density functions (PSD) calculated from AFM measurements was performed. The analysis of the amplitudes of the PSD spectra for the multilayer and the substrate surface provided the evidence of the optimized deposition parameters. The shape of the PSD curves for multilayer and substrate reveals fractal profiles with the same distribution of the roughness for both of them, attesting the influence of the substrate on the quality of the reflectors. (C) 2000 Elsevier Science B.V. All rights reserved.

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Documento generato il 11/07/20 alle ore 04:46:56