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Titolo:
Long-range energy migration in photoexcited polymers
Autore:
Yu, JW; Kim, JK; Cho, HN; Kim, DY; Kim, CY; Song, NW; Kim, D;
Indirizzi:
Korea Inst Sci & Technol, Polymer Mat Lab, Seoul 130650, South Korea KoreaInst Sci & Technol Seoul South Korea 130650 ul 130650, South Korea Korea Res Inst Stand & Sci, Nalt Creat Res Initiat Ctr Ultrafast Characterist, Taejon 305600, South Korea Korea Res Inst Stand & Sci Taejon South Korea 305600 305600, South Korea Korea Res Inst Stand & Sci, Spect Lab, Taejon 305600, South Korea Korea Res Inst Stand & Sci Taejon South Korea 305600 305600, South Korea
Titolo Testata:
MACROMOLECULES
fascicolo: 15, volume: 33, anno: 2000,
pagine: 5443 - 5447
SICI:
0024-9297(20000725)33:15<5443:LEMIPP>2.0.ZU;2-F
Fonte:
ISI
Lingua:
ENG
Soggetto:
LIGHT-EMITTING-DIODES; CONJUGATED POLYMERS; ELECTROLUMINESCENCE; BLENDS; POLY(N-VINYLCARBAZOLE); CONFINEMENT; RELAXATION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
23
Recensione:
Indirizzi per estratti:
Indirizzo: Kim, CY Korea Inst Sci & Technol, Polymer Mat Lab, POB 131, Seoul 130650, South Korea Korea Inst Sci & Technol POB 131 Seoul South Korea 130650 h Korea
Citazione:
J.W. Yu et al., "Long-range energy migration in photoexcited polymers", MACROMOLEC, 33(15), 2000, pp. 5443-5447

Abstract

Excitation migration dynamics and the energy-transfer process in a donor-acceptor pair system on photoexcitation have been investigated by using static and time-resolved photoluminescence (PL) measurements. The PL spectrum of poly(N-vinylcarbazole) (PVK) was fully superposed on the electronic absorption spectrum of poly(9,9'-di-n-hexyl-2,7-fluorenylvinylene (PDHFV) to fulfill a requirement for an efficient Forster-type energy transfer. In the PLspectrum of a blended PVK film with 0.5 wt % PDHFV on photoexcitation at 340 nm, the PL emission of PDHFV, which exhibits little absorbance at the excitation wavelength, prevailed over the PL emission of PVK. The PL spectrumof a bilayered structure with a PVK layer thickness of 4 mu m and a PDHFV layer thickness of 80 nm, which was prepared by spin-casting PDHFV solutionin trichloroethylene on a PVK film, also showed the PL emission of PDHFV on photoexcitation of the PVK layer at 340 nm without a trace of the PL emission of PVK. Excitation energy migration through a PVK bulk was observed upto a PVK thickness of 23 mu m. A time-correlated single-photon counting (TCSPC) study deduced an energy migration velocity of 3.5 x 10(6) cm/s and a dwell time between each hopping of 85 fs, respectively, in the PVK bulk of the bilayered structures with a PDHFV layer thickness of 10 or 80 nm.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 26/11/20 alle ore 09:59:20