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Titolo:
Correlation of FT-IR epitaxial thickness measurement
Autore:
Kostoulas, Y; Kneissl, G; Kohl, I;
Indirizzi:
ADE Corp, Westwood, MA 02466 USA ADE Corp Westwood MA USA 02466ADE Corp, Westwood, MA 02466 USA
Titolo Testata:
SOLID STATE TECHNOLOGY
fascicolo: 7, volume: 43, anno: 2000,
pagine: 289 -
SICI:
0038-111X(200007)43:7<289:COFETM>2.0.ZU;2-F
Fonte:
ISI
Lingua:
ENG
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
--discip_EC--
Citazioni:
2
Recensione:
Indirizzi per estratti:
Indirizzo: Kostoulas, Y ADE Corp, 77 Rowe St, Westwood, MA 02466 USA ADE Corp 77 RoweSt Westwood MA USA 02466 twood, MA 02466 USA
Citazione:
Y. Kostoulas et al., "Correlation of FT-IR epitaxial thickness measurement", SOL ST TECH, 43(7), 2000, pp. 289

Abstract

From an array of commercially available methods for measuring the thickness of epitaxial layers, including referee methods, a robust comparison has revealed that FT-IR spectroscopic analysis results in the most accurate measurements for the 0.3-25 mu m range. All other methods show significant "biases," but for thicker epi, the differences are less significant. In addition, the transition layer width and substrate doping numbers provided by the spectroscopic analysis-based technique agree well with SIMS results.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 05/12/20 alle ore 14:11:18