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Titolo:
Effect of water dose on the atomic layer deposition rate of oxide thin films
Autore:
Matero, R; Rahtu, A; Ritala, M; Leskela, M; Sajavaara, T;
Indirizzi:
Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland Univ Helsinki Helsinki Finland FIN-00014 em, FIN-00014 Helsinki, Finland Univ Helsinki, Accelerator Lab, FIN-00014 Helsinki, Finland Univ HelsinkiHelsinki Finland FIN-00014 ab, FIN-00014 Helsinki, Finland
Titolo Testata:
THIN SOLID FILMS
fascicolo: 1, volume: 368, anno: 2000,
pagine: 1 - 7
SICI:
0040-6090(20000601)368:1<1:EOWDOT>2.0.ZU;2-O
Fonte:
ISI
Lingua:
ENG
Soggetto:
BINARY REACTION SEQUENCE; SURFACE-CHEMISTRY; EPITAXY GROWTH; TIN; PRECURSOR; SILICA; H2O; TICL4;
Keywords:
atomic layer deposition; aluminium oxide; oxides;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
34
Recensione:
Indirizzi per estratti:
Indirizzo: Matero, R Univ Helsinki, Dept Chem, POB 55, FIN-00014 Helsinki, Finland Univ Helsinki POB 55 Helsinki Finland FIN-00014 lsinki, Finland
Citazione:
R. Matero et al., "Effect of water dose on the atomic layer deposition rate of oxide thin films", THIN SOL FI, 368(1), 2000, pp. 1-7

Abstract

The growth rate and properties of atomic layer deposited (ALD) Al2O3 thin films were examined by varying the water dose in the Al(CH3)(3)-H2O processat growth temperatures of 150-500 degrees C. When the growth rate was followed as a function of water pulse time, it was found to saturate with both small and large water doses but the saturated level was substantially higher for the large water dose, 1.2 vs. 1.0 Angstrom/cycle. This increase was attributed to an increased hydroxyl group density on the film surface after the water pulse. The effect of the water dose was examined also in other ALD oxide processes where in most cases the growth rate increased by 24 to 86%, in the best cases even doubled, though in a few other cases the effect was minimal. No major differences were found in the properties of the films grown with small and large water doses. (C) 2000 Elsevier Science S.A. All rights reserved.

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Documento generato il 02/10/20 alle ore 01:25:37