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Titolo:
Nano-processing with gas cluster ion beams
Autore:
Yamada, I; Matsuo, J; Insepov, Z; Aoki, T; Seki, T; Toyoda, N;
Indirizzi:
Kyoto Univ, Ion Beam Engn Expt Lab, Sakyo Ku, Kyoto 6068501, Japan Kyoto Univ Kyoto Japan 6068501 Expt Lab, Sakyo Ku, Kyoto 6068501, Japan
Titolo Testata:
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
, volume: 164, anno: 2000,
pagine: 944 - 959
SICI:
0168-583X(200004)164:<944:NWGCIB>2.0.ZU;2-G
Fonte:
ISI
Lingua:
ENG
Soggetto:
MOLECULAR-DYNAMICS SIMULATION; SOLID-SURFACES; ROUGHENING INSTABILITY; COMPUTER-SIMULATION; METAL-SURFACE; IMPLANTATION; IMPACT; TEMPERATURE; BOMBARDMENT; FILMS;
Keywords:
gas cluster ion beam processing; ion implantation; sputtering; smoothing; thin film formation;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
54
Recensione:
Indirizzi per estratti:
Indirizzo: Yamada, I Kyoto Univ, Ion Beam Engn Expt Lab, Sakyo Ku, Kyoto 6068501, Japan Kyoto Univ Kyoto Japan 6068501 Sakyo Ku, Kyoto 6068501, Japan
Citazione:
I. Yamada et al., "Nano-processing with gas cluster ion beams", NUCL INST B, 164, 2000, pp. 944-959

Abstract

This paper describes the fundamental principles and experimental status ofgas cluster ion beam (GCIB) processing as a new technique with promise forpractical industrial applications. A review is presented of the theoretical and experimental characteristics of new gas cluster ion bombardment processes and of related equipment development. The impacts of accelerated cluster ions upon substrate surfaces impart very high-energy densities in the impact regions of individual clusters and produce non-linear processes that are not present in the impacts of individual atomic ions. These unique bombardment characteristics are expected to facilitate new industrial applications that would not be possible by traditional ion beam processing. Among these are shallow ion implantation, high rate sputtering, surface cleaning andsmoothing, and low-temperature thin film formation. (C) 2000 Elsevier Science B.V. All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 27/11/20 alle ore 02:30:25