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Titolo:
TRANSMITTANCE CONTROLLED MASK (TCM) - ITS APPLICATION TO OPTICAL PROXIMITY CORRECTION AND TOPOGRAPHY
Autore:
HAN WS; CHUNG KS;
Indirizzi:
KYUNG HEE UNIV,DEPT ELECT ENGN YONGIN 449701 SOUTH KOREA KYUNG HEE UNIV,INST MAT SCI & TECHNOL YONGIN 449701 SOUTH KOREA
Titolo Testata:
Journal of the Korean Physical Society
fascicolo: 3, volume: 30, anno: 1997,
pagine: 557 - 562
SICI:
0374-4884(1997)30:3<557:TCM(-I>2.0.ZU;2-E
Fonte:
ISI
Lingua:
ENG
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
6
Recensione:
Indirizzi per estratti:
Citazione:
W.S. Han e K.S. Chung, "TRANSMITTANCE CONTROLLED MASK (TCM) - ITS APPLICATION TO OPTICAL PROXIMITY CORRECTION AND TOPOGRAPHY", Journal of the Korean Physical Society, 30(3), 1997, pp. 557-562

Abstract

A new type of mask named a TCM (Transmittance Controlled Mask) is proposed to correct for optical proximity and to overcome problems causedby topography. This mask, made from a conventional transmission mask with chromium patches on top where light attenuation is needed, is evaluated with different transmittances and is applied to the patterns which require local light attenuation caused, by a resist thickness difference or by light scattering over topography. Aerial image simulations and experiments were carried out comparatively from the view of image fidelity over topography, ft was found that good pattern formation was possible with a properly controlled transmittance mask regardless of the topography, which is a real situation in actual devices.

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Documento generato il 27/11/20 alle ore 16:03:30