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Titolo:
Effect of basic additives on acid-catalyzed electron-beam negative resist using intramolecular dehydration of phenylcarbinol
Autore:
Migitaka, S; Yamamoto, J; Uchino, S; Hashimoto, M; Murai, F; Shiraishi, H;
Indirizzi:
Hitachi Ltd, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan Hitachi Ltd Kokubunji Tokyo Japan 1858601 Kokubunji, Tokyo 1858601, Japan Hitachi Chem Co, Yamazaki Works, Hitachi, Ibaraki 3178555, Japan Hitachi Chem Co Hitachi Ibaraki Japan 3178555 chi, Ibaraki 3178555, Japan
Titolo Testata:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
fascicolo: 3A, volume: 39, anno: 2000,
pagine: 1387 - 1391
SICI:
0021-4922(200003)39:3A<1387:EOBAOA>2.0.ZU;2-8
Fonte:
ISI
Lingua:
ENG
Soggetto:
LITHOGRAPHY;
Keywords:
basic additives; 1,3,5-tris(2-(2-hydroxypropyl))benzene (triol); intramolecular dehydration; quinoline; acid-diffusion;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
--discip_EC--
Citazioni:
7
Recensione:
Indirizzi per estratti:
Indirizzo: Migitaka, S Hitachi Ltd, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan Hitachi Ltd Kokubunji Tokyo Japan 1858601 okyo 1858601, Japan
Citazione:
S. Migitaka et al., "Effect of basic additives on acid-catalyzed electron-beam negative resist using intramolecular dehydration of phenylcarbinol", JPN J A P 1, 39(3A), 2000, pp. 1387-1391

Abstract

The effect of basic additives on a negative electron-beam resist utilizingacid-catalyzed intramolecular dehydration of 1,3,5-tris(2-(2-hydroxypropyl))benzene (Triol) was investigated. Quinoline was selected as the most effective additive to suppress acid-diffusion among investigated ones. Though the addition of quinoline decreased the Triol resist sensitivity, it enhanced the contrast and critical-dimension (CD) deviation stability to post-exposure-baking temperature variation. Optimized resist system achieved the CD deviation stability: 1.5 nm/degrees C and 100-nm line and space patterns with a dose of 6.2 mu C/cm(2) @ 50 kV. Influence of the additive on the Triolresist insolubilization mechanism was discussed.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 19/01/20 alle ore 01:04:55