Catalogo Articoli (Spogli Riviste)

OPAC HELP

Titolo:
Low-pressure-MOCVD LaMnO3 +/-delta very thin films on YSZ (100) optimized for studies of the triple phase boundary
Autore:
Bertrand, GL; Caboche, G; Dufour, LC;
Indirizzi:
Univ Bourgogne, LRRS, UMR 5613 CNRS, UFR Sci & Tech, F-21078 Dijon, FranceUniv Bourgogne Dijon France F-21078 FR Sci & Tech, F-21078 Dijon, France
Titolo Testata:
SOLID STATE IONICS
fascicolo: 1-4, volume: 129, anno: 2000,
pagine: 219 - 235
SICI:
0167-2738(200004)129:1-4<219:LL+VTF>2.0.ZU;2-V
Fonte:
ISI
Lingua:
ENG
Soggetto:
YTTRIA-STABILIZED ZIRCONIA; SR-DOPED LAMNO3; ELECTRODE PROPERTIES; DEFECT STRUCTURE; ELECTROCHEMICAL PROPERTIES; LANTHANUM MANGANITE; FUEL-CELLS; LA1-XSRXMNO3; TEMPERATURE; DEPOSITION;
Keywords:
low pressure-metal organic chemical vapor deposition; triple phase boundary; LaMnO3 +/-delta; YSZ; SOFC;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
--discip_EC--
Citazioni:
47
Recensione:
Indirizzi per estratti:
Indirizzo: Bertrand, GL Univ Bourgogne, LRRS, UMR 5613 CNRS, UFR Sci & Tech, BP 47870, F-21078 Dijon, France Univ Bourgogne BP 47870 Dijon France F-21078 8 Dijon, France
Citazione:
G.L. Bertrand et al., "Low-pressure-MOCVD LaMnO3 +/-delta very thin films on YSZ (100) optimized for studies of the triple phase boundary", SOL ST ION, 129(1-4), 2000, pp. 219-235

Abstract

This paper deals with the preparation of LaMnO3+/-delta (LM) layers by lowpressure-metal organic chemical vapor deposition (LP-MOCVD) using La(tmhd)(3) and Mn(acac)(3) as organometallic precursors. By thermogravimetric analysis, these precursors were found to be suitable for LP-MOCVD in a well-defined range of total pressure and temperature of sublimation. The activationenergies of the sublimation process were found to be independent of the pressure within the appropriate range (0.06-3 kPa) and their values were 177 and 100.5 kJ mol(-1) for La(tmhd)(3) and Mn(acac)(3), respectively. LM layers of various thickness ranging between a few and a few hundred nanometers with a controlled La/Mn (L/M) ratio between 0.87 and 1.40 were grown by changing the deposition time and composition of the vapor phase. The influenceof the deposition conditions and of the post-deposition treatment on the properties of the films was also studied. (C) 2000 Elsevier Science B.V. Allrights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 30/09/20 alle ore 11:36:22