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Titolo:
High coercive NdFeB thin film obtained by diffusion annealing
Autore:
Kim, MJ; Kim, YB; Song, CB; Li, Y; Suhr, DS; Kim, CO; Kim, TK;
Indirizzi:
Korea Res Inst Stand & Sci, Taejon 305600, South Korea Korea Res Inst Stand & Sci Taejon South Korea 305600 305600, South Korea Kongju Natl Univ, Kongju 314701, Chungnam, South Korea Kongju Natl Univ Kongju Chungnam South Korea 314701 Chungnam, South Korea Chungnam Natl Univ, Taejon 305340, South Korea Chungnam Natl Univ TaejonSouth Korea 305340 Taejon 305340, South Korea
Titolo Testata:
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
fascicolo: 2, volume: 16, anno: 2000,
pagine: 111 - 112
SICI:
1005-0302(200003)16:2<111:HCNTFO>2.0.ZU;2-Q
Fonte:
ISI
Lingua:
ENG
Soggetto:
FE;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
--discip_EC--
Citazioni:
7
Recensione:
Indirizzi per estratti:
Indirizzo: Kim, YB Korea Res Inst Stand & Sci, Taejon 305600, South Korea Korea Res Inst Stand & Sci Taejon South Korea 305600 South Korea
Citazione:
M.J. Kim et al., "High coercive NdFeB thin film obtained by diffusion annealing", J MAT SCI T, 16(2), 2000, pp. 111-112

Abstract

The magnetic properties and microstructure of diffusion annealed [Ta/Nd/NdFeB/Nd/Ta] thin films have been investigated. The films were deposited on Si substrate with various thickness ratio of Nd/NdFeB layer (R=0 similar to 3.3), then diffused and crystallized by annealing at 650 degrees C for 10 min. The film without Nd layer showed soft magnetic behavior and high content of alpha-Fe phase. The films with R greater than or equal to 1 showed good hard magnetic properties with the high coercivity of about 20 kOe.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 05/04/20 alle ore 06:46:12