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Titolo:
Experimental investigations on Ne/CF4 inductively coupled discharges
Autore:
Kimura, T; Ohe, K;
Indirizzi:
Nagoya Inst Technol, Dept Syst Engn, Showa Ku, Nagoya, Aichi 4668555, Japan Nagoya Inst Technol Nagoya Aichi Japan 4668555 goya, Aichi 4668555, Japan
Titolo Testata:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
fascicolo: 1, volume: 39, anno: 2000,
pagine: 282 - 286
SICI:
0021-4922(200001)39:1<282:EIONIC>2.0.ZU;2-N
Fonte:
ISI
Lingua:
ENG
Soggetto:
NEGATIVE-ION DENSITIES; CF4 PLASMA; RF PLASMA; CHEMISTRY; SILICON; PHYSICS;
Keywords:
inductively coupled discharge; Langmuir probe; electron energy distribution function; dissociation; Ne/CF4 mixture; Ar/CF4 mixture;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
--discip_EC--
Citazioni:
15
Recensione:
Indirizzi per estratti:
Indirizzo: Kimura, T Nagoya Inst Technol, Dept Syst Engn, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan Nagoya Inst Technol Gokiso Cho Nagoya Aichi Japan 4668555 Japan
Citazione:
T. Kimura e K. Ohe, "Experimental investigations on Ne/CF4 inductively coupled discharges", JPN J A P 1, 39(1), 2000, pp. 282-286

Abstract

A Langmuir probe measurement was applied to an inductively-coupled RF (13.56 MHz) Ne/CF4 discharge over a pressure range from 20 mTorr to 60 mTorr while changing the CF4 content from 5 to 20%, and keeping the power injected into the plasma at about 100W. The measured electron energy distribution function (EEDF) under any condition deviated from the Maxwellian distributionin the energy region higher than the lowest excitation threshold energy ofNe. The average electron energy, electron density and dissociation rate coefficient estimated using the measured EEDF decreased slightly with increasing CF4 content. The EEDF and the dissociation rate coefficient in Ar/CF4 and Ne/CF4 discharges under an equally injected power were compared. The number of electrons with energy higher than the dissociation threshold energy in Ne/CF4 were much larger than that in Ar/CF4, yielding a difference in dissociation rate coefficient of one order of magnitude.

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Documento generato il 09/07/20 alle ore 20:02:53