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Titolo:
IN-SITU INVESTIGATIONS ON THE SILAR-GROWTH OF ZNS FILMS AS STUDIED BYTAPPING MODE ATOMIC-FORCE MICROSCOPY
Autore:
RESCH R; FRIEDBACHER G; GRASSERBAUER M; KANNIAINEN T; LINDROOS S; LESKELA M; NIINISTO L;
Indirizzi:
VIENNA TECH UNIV,INST ANALYT CHEM,GETREIDEMARKT 9-151 A-1060 VIENNA AUSTRIA VIENNA TECH UNIV,INST ANALYT CHEM A-1060 VIENNA AUSTRIA UNIV HELSINKI,DEPT CHEM FIN-00014 HELSINKI FINLAND HELSINKI UNIV TECHNOL,INORGAN & ANALYT CHEM LAB FIN-02150 ESPOO FINLAND
Titolo Testata:
Fresenius' journal of analytical chemistry
fascicolo: 1-2, volume: 358, anno: 1997,
pagine: 80 - 84
SICI:
0937-0633(1997)358:1-2<80:IIOTSO>2.0.ZU;2-P
Fonte:
ISI
Lingua:
ENG
Soggetto:
IONIC-LAYER ADSORPTION; THIN-FILMS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
13
Recensione:
Indirizzi per estratti:
Citazione:
R. Resch et al., "IN-SITU INVESTIGATIONS ON THE SILAR-GROWTH OF ZNS FILMS AS STUDIED BYTAPPING MODE ATOMIC-FORCE MICROSCOPY", Fresenius' journal of analytical chemistry, 358(1-2), 1997, pp. 80-84

Abstract

Tapping mode atomic force microscopy (TM-AFM) has been successfully used for in-situ imaging of the deposition of ZnS films with the successive ionic layer adsorption and reaction (SILAR) method. The films were deposited in-situ using the commercial TM-AFM liquid cell as a flow-through reactor. The potential of TM-AFM has been used to study the growth of ZnS on different substrates up to 50 SILAR cycles, Reactants and rinsing water were alternately exchanged in the cell by a computer controlled valve system. Tn comparison to earlier work performed with the conventional AFM operated in contact mode, imaging artefacts introduced by lateral shear forces can be largely eliminated with TM-AFM. On glass the roughness is observed to decrease initially until typical island formation takes place at a larger number of deposition cycles. On mica island formation can be observed right from the beginning of the process and the roughness increases with increasing number of deposition cycles.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 05/07/20 alle ore 22:28:26