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Titolo:
Use of an SF5+ polyatomic primary ion beam for ultrashallow depth profiling on an ion microscope secondary ion mass spectroscopy instrument
Autore:
Gillen, G; Walker, M; Thompson, P; Bennett, J;
Indirizzi:
Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA Natl Inst Stand & Technol Gaithersburg MD USA 20899 ersburg, MD 20899 USA USN, Res Lab, Washington, DC 20375 USA USN Washington DC USA 20375USN, Res Lab, Washington, DC 20375 USA SEMATECH, Austin, TX 78741 USA SEMATECH Austin TX USA 78741SEMATECH, Austin, TX 78741 USA
Titolo Testata:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
fascicolo: 1, volume: 18, anno: 2000,
pagine: 503 - 508
SICI:
1071-1023(200001/02)18:1<503:UOASPP>2.0.ZU;2-Z
Fonte:
ISI
Lingua:
ENG
Soggetto:
SPECTROMETRY; RESOLUTION; ENERGY; BOMBARDMENT;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
15
Recensione:
Indirizzi per estratti:
Indirizzo: Gillen, G Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA Natl Inst Stand & Technol Gaithersburg MD USA 20899 D 20899 USA
Citazione:
G. Gillen et al., "Use of an SF5+ polyatomic primary ion beam for ultrashallow depth profiling on an ion microscope secondary ion mass spectroscopy instrument", J VAC SCI B, 18(1), 2000, pp. 503-508

Abstract

A magnetic sector secondary ion mass spectrometry (SIMS) instrument has been fitted with a modified hot filament duoplasmatron ion source for generation of SF5+ primary ion beams for SIMS depth profiling applications. The SF5+ primary ion beam has been evaluated by depth profiling of several low energy boron ion implants, baron delta-doped structures and a Ni/Cr metal multilayer depth profiling standard reference material. Using 3.0 keV impact SF5+ bombardment at a 52 degrees impact angle with oxygen flooding gives a trailing edge decay length (Ile) for the baron implants and delta-doped layers of 1.3 nm. Under the same conditions, O-2(+) bombardment gives a trailing edge decay length (1/e) of 2.3 nm. The use of the SF5+ beam without oxygen flooding gives a substantial increase in decay length that is related to the formation of ripples as determined by atomic force microscopy. In the case of the Ni/Cr reference material, a significant reduction in sputter-induced topography is observed with SF5+ bombardment. (C) 2000 American VacuumSociety. [S0734-211X(00)01101-X].

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Documento generato il 26/01/21 alle ore 04:35:01