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Titolo:
Calculated C-MoSi2 and B-Mo5Si3 pseudo-binary phase diagrams for the use in advanced materials processing
Autore:
Fan, XB; Hack, K; Ishigaki, T;
Indirizzi:
Natl Inst Res Inorgan Mat, Tsukuba, Ibaraki 3050044, Japan Natl Inst Res Inorgan Mat Tsukuba Ibaraki Japan 3050044 ki 3050044, Japan GTT Technol, D-52134 Herzogenrath 3, Germany GTT Technol Herzogenrath Germany 3 hnol, D-52134 Herzogenrath 3, Germany
Titolo Testata:
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
fascicolo: 1-2, volume: 278, anno: 2000,
pagine: 46 - 53
SICI:
0921-5093(20000215)278:1-2<46:CCABPP>2.0.ZU;2-2
Fonte:
ISI
Lingua:
ENG
Soggetto:
MOLYBDENUM DISILICIDE; THERMODYNAMIC EVALUATION; MOSI2-SIC COMPOSITES; OXIDATION BEHAVIOR; C SYSTEM; MO; INTERMETALLICS; METHANE; MO5SI3; BORON;
Keywords:
Mo-Si-C; Mo-Si-B; molybdenum silicide; phase diagram; thermodynamic equilibrium calculation;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
38
Recensione:
Indirizzi per estratti:
Indirizzo: Ishigaki, T Natl Inst Res Inorgan Mat, Namiki 1-1, Tsukuba, Ibaraki 3050044, Japan Natl Inst Res Inorgan Mat Namiki 1-1 Tsukuba Ibaraki Japan 3050044
Citazione:
X.B. Fan et al., "Calculated C-MoSi2 and B-Mo5Si3 pseudo-binary phase diagrams for the use in advanced materials processing", MAT SCI E A, 278(1-2), 2000, pp. 46-53

Abstract

The phase diagrams were calculated for the pseudo-binary systems, C-MoSi2,and B-Mo5Si3, in which the composites have significant potentials to function in high-temperature environments. The calculations have been executed with the aid of the software ChemSage and thermodynamic data derived based on the solution database of Scientific Group Thermodata Europe (SGTE). The constructed phase diagrams-are discussed with respect to some published experimental information for the fabrication of molybdenum silicide materials and provide a guideline for the experimental work of advanced materials processing, such as second-phase reinforcement for MoSi2 and other low silicides in the Mo-Si system. (C) 2000 Elsevier Science S.A. All rights reserved.

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Documento generato il 04/12/20 alle ore 13:12:32