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Titolo:
Effects of N-2 addition on aluminum alloy etching in inductively coupled plasma source
Autore:
Kim, KH; Baek, KH; Shin, KS; Park, C; Lee, WG;
Indirizzi:
Hyundai Elect Ind Co Ltd, Syst IC R&D Ctr, Kyungkido 467701, South Korea Hyundai Elect Ind Co Ltd Kyungkido South Korea 467701 67701, South Korea
Titolo Testata:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
fascicolo: 10, volume: 38, anno: 1999,
pagine: 6090 - 6096
SICI:
0021-4922(199910)38:10<6090:EONAOA>2.0.ZU;2-4
Fonte:
ISI
Lingua:
ENG
Soggetto:
CL-2 PLASMAS; PRESSURE; DENSITY; ETCHER;
Keywords:
plasma etching; inductively coupled plasma source; optical emission spectroscopy; effect of N-2; sidewall partial etching; sidewall fringe;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
--discip_EC--
Citazioni:
17
Recensione:
Indirizzi per estratti:
Indirizzo: Kim, KH Hyundai Elect Ind Co Ltd, Syst IC R&D Ctr, San 136-1 Ami-ri, Kyungkido 467701, South Korea Hyundai Elect Ind Co Ltd San 136-1 Ami-ri Kyungkido South Korea 467701
Citazione:
K.H. Kim et al., "Effects of N-2 addition on aluminum alloy etching in inductively coupled plasma source", JPN J A P 1, 38(10), 1999, pp. 6090-6096

Abstract

Addition of N-2 to the plasma activated with Cl-2, BCl3, or their mixturesin an inductively coupled plasma source induces drastic changes in the plasma state. These N-2-related changes in the plasma state sometimes result in abnormal phenomena in aluminum alloy etching, like the wave-like fringes on the sidewalls of patterned metal lines. Optical emission spectroscopy revealed that admixing small amounts of N-2 to the plasma activated with Cl-2, BCl3, or their mixtures generally expedites dissociation processes to increase the density of Cl* radicals within it. On the other hand, N2 additionalso accelerates the formation of passivation polymers via carbon species sputtered from patterned photo-resists. The polymers adhere to the sidewalls of patterned metal lines and protect them against the lateral attacks of deflected etchants such as Cl* radicals. Our studies tell that the relativeabundance of Cl* radicals within the plasma over the passivation polymers,which is controlled by the amount of N-2 addition, seems to be a critical factor in determining the occurrence of the wave-like fringes on the sidewalls of patterned metal lines.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 30/11/20 alle ore 03:35:10