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Titolo:
Atomic force microscopic studies of oxide thin films on organic self-assembled monolayers
Autore:
Niesen, TP; De Guire, MR; Bill, J; Aldinger, F; Ruhle, M; Fischer, A; Jentoft, FC; Schlogl, R;
Indirizzi:
Max Planck Inst Met Forsch, D-70569 Stuttgart, Germany Max Planck Inst MetForsch Stuttgart Germany D-70569 Stuttgart, Germany Univ Stuttgart, Inst Nichtmet Anorgan Mat, Pulvermet Lab, D-70569 Stuttgart, Germany Univ Stuttgart Stuttgart Germany D-70569 Lab, D-70569 Stuttgart, Germany Max Planck Inst Met Forsch, D-70174 Stuttgart, Germany Max Planck Inst MetForsch Stuttgart Germany D-70174 Stuttgart, Germany Max Planck Gesell, Fritz Haber Inst, Abt Anorgan Chem, D-14195 Berlin, Germany Max Planck Gesell Berlin Germany D-14195 n Chem, D-14195 Berlin, Germany
Titolo Testata:
JOURNAL OF MATERIALS RESEARCH
fascicolo: 6, volume: 14, anno: 1999,
pagine: 2464 - 2475
SICI:
0884-2914(199906)14:6<2464:AFMSOO>2.0.ZU;2-I
Fonte:
ISI
Lingua:
ENG
Soggetto:
IONIC LAYER ADSORPTION; DEPOSITION MECHANISM; ZNS FILMS; GROWTH; SURFACE; MICA; GOLD; ACID; AGGREGATION; AU(111);
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
47
Recensione:
Indirizzi per estratti:
Indirizzo: Niesen, TP Max Planck Inst Met Forsch, Heisenbergstr 5, D-70569 Stuttgart,Germany Max Planck Inst Met Forsch Heisenbergstr 5 Stuttgart Germany D-70569
Citazione:
T.P. Niesen et al., "Atomic force microscopic studies of oxide thin films on organic self-assembled monolayers", J MATER RES, 14(6), 1999, pp. 2464-2475

Abstract

The surface morphology of TiO2- and ZrO2-based thin films, deposited from aqueous solution at 70-80 degrees C onto functionalized organic self-assembled monolayers (SAMs) on silicon has been examined using atomic force microscopy (AFM). The films have been previously shown to consist, respectively,of nanocrystalline TiO2 (anatase) and of nanocrystalline tetragonal ZrO2 with amorphous basic zirconium sulfate. The films exhibit characteristic surface roughnesses on two length scales. Roughness on the nanometer scale appears to be dictated by the size of the crystallites in the film. Roughness on the micron scale is postulated to be related to several factors, including the topography of the SAM and the effects of larger, physisorbed particles or agglomerates. The topographies of the oxide thin films, on both the nanometer and micron scales, are consistent with a particle-attachment mechanism of film growth.

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Documento generato il 15/07/20 alle ore 05:29:41