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Titolo:
Atomic layer deposited thin films for corrosion protection
Autore:
Matero, R; Ritala, M; Leskela, M; Salo, T; Aromaa, J; Forsen, O;
Indirizzi:
Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland Univ Helsinki Helsinki Finland FIN-00014 em, FIN-00014 Helsinki, Finland Helsinki Univ Technol, Lab Corros & Mat Chem, Espoo 02015, Finland Helsinki Univ Technol Espoo Finland 02015 Mat Chem, Espoo 02015, Finland
Titolo Testata:
JOURNAL DE PHYSIQUE IV
fascicolo: P8, volume: 9, anno: 1999,
parte:, 1
pagine: 493 - 499
SICI:
1155-4339(199909)9:P8<493:ALDTFF>2.0.ZU;2-J
Fonte:
ISI
Lingua:
ENG
Soggetto:
TOF-ERDA; BEHAVIOR; EPITAXY;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
14
Recensione:
Indirizzi per estratti:
Indirizzo: Matero, R Univ Helsinki, Dept Chem, POB 55, FIN-00014 Helsinki, Finland Univ Helsinki POB 55 Helsinki Finland FIN-00014 lsinki, Finland
Citazione:
R. Matero et al., "Atomic layer deposited thin films for corrosion protection", J PHYS IV, 9(P8), 1999, pp. 493-499

Abstract

The suitability of Atomic Layer Deposition for making corrosion protectioncoatings was examined. Thin films of Al2O3, TiO2, Ta2O5 and Al2O3-TiO2 multilayers were deposited on stainless steel substrates. The films were deposited at 150-400 degrees C. The corrosion behaviour of the samples was studied by Electrochemical Impedance Spectroscopy in 3.5 wt.% NaCl and 0.1, and 1 mol/l HCl solutions. Al2O3 was found to protect the substrate material. against corrosion for a limited time in NaCl. TiO2 alone does not give good protection, but when combined with Al2O3 in a multilayer structure better protection is achieved. Ta2O5 films were tested in HCl and were found to protect the base material to some extent.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 29/09/20 alle ore 23:41:18