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Titolo:
In situ characterization of atomic layer deposition processes by a mass spectrometer
Autore:
Ritala, M; Juppo, M; Kukli, K; Rahtu, A; Leskela, M;
Indirizzi:
Univ Helsinki, Inorgan Chem Lab, FIN-00014 Helsinki, Finland Univ Helsinki Helsinki Finland FIN-00014 ab, FIN-00014 Helsinki, Finland Tartu State Univ, Inst Expt Phys & Technol, EE-51010 Tartu, Estonia Tartu State Univ Tartu Estonia EE-51010 Technol, EE-51010 Tartu, Estonia
Titolo Testata:
JOURNAL DE PHYSIQUE IV
fascicolo: P8, volume: 9, anno: 1999,
parte:, 2
pagine: 1021 - 1028
SICI:
1155-4339(199909)9:P8<1021:ISCOAL>2.0.ZU;2-L
Fonte:
ISI
Lingua:
ENG
Soggetto:
OXIDE THIN-FILMS; BINARY REACTION SEQUENCE; TANTALUM OXIDE; EPITAXY GROWTH; IN-SITU; H2O; MECHANISMS; CHEMISTRY; SURFACE; ALE;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
29
Recensione:
Indirizzi per estratti:
Indirizzo: Ritala, M Univ Helsinki, Inorgan Chem Lab, POB 55, FIN-00014 Helsinki, Finland Univ Helsinki POB 55 Helsinki Finland FIN-00014 lsinki, Finland
Citazione:
M. Ritala et al., "In situ characterization of atomic layer deposition processes by a mass spectrometer", J PHYS IV, 9(P8), 1999, pp. 1021-1028

Abstract

In situ characterization of the chemical reactions in atomic layer deposition (ALD) processes in flow-type reactors is an important and challenging task. For this purpose, a quadrupole mass spectrometer has been integrated to an ALD reactor. The special features of this setup are described and its performance is demonstrated by studies on ALD oxide processes employing Al(CH3)(3), Ti(OC2H5)(4), Ta(OC2H5)(5) and Nb(OC2H5)(5) as metal precursors and water as the oxygen source.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 23/09/20 alle ore 05:02:16