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Titolo:
Application of infrared reflection spectroscopy for the analysis of hard coatings on metallic substrates
Autore:
Heger, P; Marx, G;
Indirizzi:
TU Chemnitz, Inst Chem, D-09107 Chemnitz, Germany TU Chemnitz Chemnitz Germany D-09107 nst Chem, D-09107 Chemnitz, Germany
Titolo Testata:
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY
fascicolo: 1-3, volume: 365, anno: 1999,
pagine: 103 - 105
SICI:
0937-0633(199909/10)365:1-3<103:AOIRSF>2.0.ZU;2-R
Fonte:
ISI
Lingua:
ENG
Soggetto:
FILMS; DEPOSITION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
11
Recensione:
Indirizzi per estratti:
Indirizzo: Heger, P TU Chemnitz, Inst Chem, D-09107 Chemnitz, Germany TU Chemnitz Chemnitz Germany D-09107 D-09107 Chemnitz, Germany
Citazione:
P. Heger e G. Marx, "Application of infrared reflection spectroscopy for the analysis of hard coatings on metallic substrates", FRESEN J AN, 365(1-3), 1999, pp. 103-105

Abstract

A method is presented for calculating the absorption spectrum, the film thickness and the index of refraction from IR reflection spectra. Consideringreal test conditions (partial incoherence, scattering) a routinely usable instrument was created with this direct calculation of the absorption spectrum, which provides a very good correspondence between the measurement and simulation also without any initial information about the expected spectrum. This method is applied to characterize hard coatings deposited on iron substrates by glow discharge assisted CVD processes with organic silicon and boron compounds as precursors. In addition to the qualitative microstructural characterization of these coatings, this method is suitable for a rapid,exact and non-destructive determination of the film thickness and the index of refraction.

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Documento generato il 26/09/20 alle ore 23:03:15