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Titolo:
Plasma doping: Progress and potential
Autore:
Chu, PK; Felch, SB; Kellerman, P; Sinclair, F; Larson, LA; Mizuno, B;
Indirizzi:
City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong City Univ Hong Kong Kowloon Hong Kong hys & Mat Sci, Kowloon, Hong Kong Varian Semicond Equipment Assoc, Palo Alto, CA USA Varian Semicond Equipment Assoc Palo Alto CA USA ssoc, Palo Alto, CA USA Eaton Corp, Beverly, MA USA Eaton Corp Beverly MA USAEaton Corp, Beverly, MA USA SEMATECH, Austin, TX 78741 USA SEMATECH Austin TX USA 78741SEMATECH, Austin, TX 78741 USA Matsushita Elect Ind Co Ltd, Osaka, Japan Matsushita Elect Ind Co Ltd Osaka Japan Elect Ind Co Ltd, Osaka, Japan
Titolo Testata:
SOLID STATE TECHNOLOGY
fascicolo: 9, volume: 42, anno: 1999,
pagine: 55 -
SICI:
0038-111X(199909)42:9<55:PDPAP>2.0.ZU;2-L
Fonte:
ISI
Lingua:
ENG
Soggetto:
IMMERSION ION-IMPLANTATION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
--discip_EC--
Citazioni:
28
Recensione:
Indirizzi per estratti:
Indirizzo: Chu, PK City Univ Hong Kong, Dept Phys & Mat Sci, 83 Tat Chee Ave, Kowloon, Hong Kong City Univ Hong Kong 83 Tat Chee Ave Kowloon Hong Kong Hong Kong
Citazione:
P.K. Chu et al., "Plasma doping: Progress and potential", SOL ST TECH, 42(9), 1999, pp. 55

Abstract

Beam-line ion implantation, the pre-eminent doping method in silicon, is being pushed to the limit by the need to fabricate ultra-shallow junctions. Plasma doping is envisaged to be the alternative technique suited for the shift to simpler, more economical, higher throughput, and cluster-compatiblehardware. The technology has gained much momentum in the past several years and an international plasma doping users group has been formed to bring together equipment manufacturers, process engineers, and researchers. In this article (part one of two parts), we will review the current status of plasma doping, present the latest device data, and discuss process and equipment issues.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 27/11/20 alle ore 13:52:09