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Titolo:
Temperature and time evolution of ripple structure induced by ion sputtering on Cu(110)
Autore:
Rusponi, S; Costantini, G; Boragno, C; Valbusa, U;
Indirizzi:
INFM, Unita Ric Genova, Genoa, Italy INFM Genoa ItalyINFM, Unita Ric Genova, Genoa, Italy Univ Genoa, Dipartimento Fis, CNR, Ctr Fis Superf & Basse Temp, Genoa, Italy Univ Genoa Genoa Italy , CNR, Ctr Fis Superf & Basse Temp, Genoa, Italy
Titolo Testata:
PHYSICS OF LOW-DIMENSIONAL STRUCTURES
, volume: 5-6, anno: 1999,
pagine: 95 - 103
SICI:
0204-3467(1999)5-6:<95:TATEOR>2.0.ZU;2-R
Fonte:
ISI
Lingua:
ENG
Soggetto:
MOLECULAR-BEAM EPITAXY; ROUGHENING INSTABILITY; SURFACE-DIFFUSION; BOMBARDED SI; GROWTH; MORPHOLOGY; HOMOEPITAXY; TOPOGRAPHY; RELAXATION; STM;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
29
Recensione:
Indirizzi per estratti:
Indirizzo: Rusponi, S INFM, Unita Ric Genova, Genoa, Italy INFM Genoa ItalyINFM, Unita Ric Genova, Genoa, Italy
Citazione:
S. Rusponi et al., "Temperature and time evolution of ripple structure induced by ion sputtering on Cu(110)", PHYS LOW-D, 5-6, 1999, pp. 95-103

Abstract

The surface morphology generated by ion sputtering on a Cu(110) crystal has been investigated by Scanning Tunneling Microscopy (STM). A ripple structure is observed for all the considered values of the incident ion beam angle theta (0 degrees < theta < 70 degrees). In particular, normal:sputtering produces a well defined ripple structure whose wave vector rotates from (001) to (1 (1) over bar 0) by increasing the substrate temperature. Moreover,for theta = 45 degrees the ripple wavelength lambda increases in time following a scaling law lambda proportional to t(z), with z = 0.26 +/- 0.02. These results are described by a continuum equation which includes, in addition to the surface curvature dependent erosion terms, a diffusion term that takes into account both the surface anisotropy and the effect of an Ehrlich-Schwoebel barrier.

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Documento generato il 03/12/20 alle ore 12:26:58