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Titolo:
Investigation of passive films on alpha(2) and gamma titanium aluminides by X-ray photoelectron spectroscopy
Autore:
Ziomek-Moroz, M; Su, W; Covino, BS;
Indirizzi:
Oregon Grad Inst, Dept Mat Sci & Engn, Portland, OR 97291 USA Oregon Grad Inst Portland OR USA 97291 Sci & Engn, Portland, OR 97291 USA Engn Animat Inc, Ames, IA 50010 USA Engn Animat Inc Ames IA USA 50010Engn Animat Inc, Ames, IA 50010 USA Albany Res Ctr, Dept Energy, Albany, OR 97321 USA Albany Res Ctr Albany OR USA 97321 Ctr, Dept Energy, Albany, OR 97321 USA
Titolo Testata:
CORROSION
fascicolo: 7, volume: 55, anno: 1999,
pagine: 635 - 643
SICI:
0010-9312(199907)55:7<635:IOPFOA>2.0.ZU;2-G
Fonte:
ISI
Lingua:
ENG
Soggetto:
SURFACE CHARACTERIZATION; OXIDE-FILMS; STATE; ALLOYS; FE;
Keywords:
aluminum; films; intermetallics; potentiodynamic; potentiostatic; sodium hydroxide; sulfuric acid; titanium; titanium aluminide; x-ray photoelectron spectroscopy;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
Citazioni:
17
Recensione:
Indirizzi per estratti:
Indirizzo: Ziomek-Moroz, M Oregon Grad Inst, Dept Mat Sci & Engn, POB 91000, Portland, OR 97291 USA Oregon Grad Inst POB 91000 Portland OR USA 97291 97291 USA
Citazione:
M. Ziomek-Moroz et al., "Investigation of passive films on alpha(2) and gamma titanium aluminides by X-ray photoelectron spectroscopy", CORROSION, 55(7), 1999, pp. 635-643

Abstract

Passive films on alpha(2) and gamma titanium aluminide formed potentiostatically in sodium hydroxide (NaOH) and sulfuric acid (H2SO4) solutions were studied by x-ray photoelectron spectroscopy (XPS), In NaOH, potentiostatic experiments showed that titanium aluminides had very similar passive current densities to that of Ti. XPS sputter depth profile showed nearly no Al present in the outer layer of the passive films. In H2SO4, passive current densities increased for specimens with increasing Al content. XPS sputter depth profile showed that Al was enriched in. outer layers of the passive films. These results indicated that the passive film dissolution rate increasedwith increasing amounts of Al in the passive film for titanium aluminides.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 10/07/20 alle ore 12:53:38