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Titolo:
Angle-resolved XPS investigation of the fluorine-related passivation layeron etched Al (Cu 1%) surface after SF6 treatment
Autore:
Yoon, YS; Baek, KH; Park, JM; Kwon, KH; Kim, CI; Hwang, IG;
Indirizzi:
Elect & Telecommun Res Inst, Taejon 305600, South Korea Elect & TelecommunRes Inst Taejon South Korea 305600 05600, South Korea Hanseo Univ, Dept Elect Engn, Asan 356820, South Korea Hanseo Univ Asan South Korea 356820 Elect Engn, Asan 356820, South Korea Chungang Univ, Sch Elect & Elect Engn, Seoul 156756, South Korea Chungang Univ Seoul South Korea 156756 t Engn, Seoul 156756, South Korea Jeonju Univ, Sch Elect & Elect Engn, Jeonju 560240, South Korea Jeonju Univ Jeonju South Korea 560240 t Engn, Jeonju 560240, South Korea
Titolo Testata:
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
, volume: 34, anno: 1999, supplemento:, S
pagine: S305 - S309
SICI:
0374-4884(199906)34:<S305:AXIOTF>2.0.ZU;2-8
Fonte:
ISI
Lingua:
ENG
Soggetto:
SI-CU; CORROSION; MECHANISM; FILMS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
16
Recensione:
Indirizzi per estratti:
Indirizzo: Yoon, YS Elect & Telecommun Res Inst, Taejon 305600, South Korea Elect & Telecommun Res Inst Taejon South Korea 305600 uth Korea
Citazione:
Y.S. Yoon et al., "Angle-resolved XPS investigation of the fluorine-related passivation layeron etched Al (Cu 1%) surface after SF6 treatment", J KOR PHYS, 34, 1999, pp. S305-S309

Abstract

A fluorine-related passivation layer on etched Al-Cu alloy films was investigated by transmission electron microscope (TEM) and angle-resolved X-ray photoelectron spectroscopy (XPS). The passivation layer was produced duringSF6 plasma treatments after SiCl4/Cl-2/He/CHF3 mixed gas plasma etching. The passivation layer is composed of fluorine-aluminum compounds on the etched Al-Cu surface. It was found that this lay er suppresses effectively the corrosion on the etched surface by preventing moisture penetration from aireven if the residual chlorine atoms exist on the etched surface. The existence of the passivation layer was verified by TEM analysis. To investigate characteristics of the passivation layer, angle-resolved XPS was carried out for heat-treated samples. The heat treatments of the samples were in-situcarried out in the XPS analysis chamber for the temperatures of 150, 300, and 400 degrees C, respectively. The binding energy of the composed elements of the passivation layer shifted to the higher binding energy position asthe heat treatment temperature was increased.

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Documento generato il 30/11/20 alle ore 03:12:57