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Titolo:
Ion beam assisted etching of a fluorinated polyimide in order to insert itin an electro-optical system
Autore:
Lucas, B; Moussant, C; Antony, R; Moliton, A;
Indirizzi:
Univ Limoges, UMOP, F-87060 Limoges, France Univ Limoges Limoges France F-87060 moges, UMOP, F-87060 Limoges, France
Titolo Testata:
SYNTHETIC METALS
fascicolo: 1-3, volume: 102, anno: 1999,
pagine: 1423 - 1424
SICI:
0379-6779(199906)102:1-3<1423:IBAEOA>2.0.ZU;2-L
Fonte:
ISI
Lingua:
ENG
Keywords:
polymer; etching; sputtering; waveguides;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
6
Recensione:
Indirizzi per estratti:
Indirizzo: Lucas, B Univ Limoges, UMOP, 123 Av Albert Thomas, F-87060 Limoges, FranceUniv Limoges 123 Av Albert Thomas Limoges France F-87060 France
Citazione:
B. Lucas et al., "Ion beam assisted etching of a fluorinated polyimide in order to insert itin an electro-optical system", SYNTH METAL, 102(1-3), 1999, pp. 1423-1424

Abstract

Etching of a fluorinated polyimide (6FDA-ODA) was realized by the IBAE (Ion Beam Assisted Etching) technique which uses an inert ion beam (Ar+ for example) to carry a reactive flux (oxygen for example) towards the target. This ion beam reactive etching enables us to obtain etching rates of about 60nm/min by maintaining a pressure of about 10(-4) Torr in the irradiation chamber.

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Documento generato il 10/07/20 alle ore 08:46:05